H01J 2237/006
Details of gas supplies
Official title: Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece, (H01J37/3244 takes precedence; environmental cells for electron microscopes H01J2237/2003; microscopes with environmental specimen chamber H01J2237/2608)
H01J2237/006 (Details of gas supplies) appears on 411 US grants and 496 published applications in this corpus.
Search patents in H01J- Granted patents
- 411
- Published applications
- 496
- Assignees
- 152
- Inventors
- 968
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 3 | 0 |
| 1998 | 3 | 0 |
| 1999 | 0 | 0 |
| 2000 | 5 | 0 |
| 2001 | 3 | 0 |
| 2002 | 2 | 3 |
| 2003 | 2 | 0 |
| 2004 | 0 | 4 |
| 2005 | 1 | 3 |
| 2006 | 7 | 10 |
| 2007 | 3 | 8 |
| 2008 | 3 | 20 |
| 2009 | 11 | 23 |
| 2010 | 11 | 22 |
| 2011 | 21 | 17 |
| 2012 | 14 | 23 |
| 2013 | 18 | 21 |
| 2014 | 26 | 29 |
| 2015 | 30 | 29 |
| 2016 | 23 | 32 |
| 2017 | 25 | 32 |
| 2018 | 19 | 20 |
| 2019 | 24 | 30 |
| 2020 | 23 | 31 |
| 2021 | 29 | 21 |
| 2022 | 17 | 27 |
| 2023 | 21 | 26 |
| 2024 | 20 | 33 |
| 2025 | 18 | 21 |
| 2026 | 18 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Sample holder, electron microscope system and sample observation method18 Aug 2026US 12,712,146 B2Hitachi, Ltd.
- Actively cooled gas line for ion source4 Aug 2026US 12,700,565 B2APPLIED Materials.Inc.
- Sample chamber heating assembly1 Oct 2026US 2026/0302127 A1
- Charged particle beam device and deposition method17 Sep 2026US 2026/0279725 A1Kioxia Corporation
- Mixed-gas species plasma source system10 Sep 2026US 2026/0269181 A1FEI Company
- Focused charged particle beam device with a precursor source, and method for processing or imaging samples30 Jul 2026US 2026/0221380 A1Tescan Group A.S.
- Ion source28 May 2026US 2026/0150177 A1Nissin Ion Equipment Co., Ltd.
Most cited
By later US patents
- Method for implanting negative hydrogen ion and implanting apparatus190US 6,335,535 B12002
- Multilayered device micro etching method and system96US 5,055,696 AHitachi, Ltd. · 1991
- Gas injection system95US 5,435,850 AFEI Company · 1995
- Gas delivery systems for particle beam processing95US 5,851,413 AMicrion Corporation · 1998
- Method of semiconductor device manufacture89US 5,188,705 AFEI Company · 1993