Vacuum processing device

A vacuum processing apparatus comprising:

• a sample chamber configured to accommodate a sample;
• a preliminary exhaust chamber configured to temporarily hold the sample when the sample is transferred between the sample chamber and outside air;
• a pipe configured to transfer a gas between an inside of the preliminary exhaust chamber and the outside air;
• a conductance variable device configured to change a conductance of the pipe;
• and
• a computer system configured to control the conductance variable device, wherein
• the computer system acquires a parameter corresponding to fragility of a shape pattern formed on the sample,
• when the fragility corresponding to the parameter is first fragility, the computer system controls the conductance variable device such that the conductance of the pipe is a first conductance, and
• when the fragility corresponding to the parameter is second fragility which is weaker than the first fragility, the computer system controls the conductance variable device such that the conductance of the pipe is a second conductance lower than the first conductance.