Charged particle beam device and deposition method
AssigneeKioxia Corporation
InventorMitsuo KOIKE
Life of this patent
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Abstract
A charged particle beam device includes a chamber configured to accommodate a target; a first beam generator configured to irradiate the target with a charged particle beam in a first direction; a first nozzle configured to introduce a first gas to the chamber for depositing a material on the target, the first nozzle extending toward a first position on the target being irradiated with the charged particle beam; and a second nozzle configured to introduce a rare gas to the chamber, the second nozzle extending toward a second position above the first position.
Claims20
A charged particle beam device comprising:
- a chamber configured to accommodate a target;
- a first beam generator configured to irradiate the target with a charged particle beam in a first direction;
- a first nozzle configured to introduce a first gas to the chamber for depositing a material on the target, the first nozzle extending toward a first position on the target being irradiated with the charged particle beam;
- and
- a second nozzle configured to introduce a rare gas to the chamber, the second nozzle extending toward a second position above the first position.
A deposition method comprising:
- irradiating a target accommodated in a chamber with a charged particle beam;
- introducing, into the chamber, a first gas and a rare gas on the target;
- and
- depositing a reaction product of the first gas on the target to be irradiated with the charged particle beam, without substantially containing a component of the rare gas.
Dependencies are inferred from the claim text.