Focused charged particle beam device with a precursor source, and method for processing or imaging samples
AssigneeTescan Group A.S.
InventorMiroslav RUDOLF
Life of this patent
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Abstract
A focused charged particle beam device for processing or imaging samples having a working chamber in which a particle source extends, an optical system for focusing the charged particle beam, and a support for holding the sample to be processed or imaged. At least one nozzle supplies at least one gas extending into the working chamber so that the gas is introduced to the sample to be processed or imaged. The nozzle supplying the gas is connected to a reservoir that contains a superabsorbent polymer with a gas precursor. A method is also described for processing or imaging samples using the device.
Claims10
A focused charged particle beam device for processing or imaging a sample, said device comprising:
- a working chamber (1) into which a particle source extends, and further comprising an optical system (3) for focusing the charged particle beam and a support (4) for holding a sample (8) to be processed or imaged,
- wherein at least one nozzle (10, 11) supplying at least one gas extends into the working chamber (1) so that the gas is introduced to the sample (8) to be processed or displayed, and
- wherein the nozzle (10, 11) supplying the gas is connected to a reservoir (9, 12) containing a superabsorbent polymer with a gas precursor.
A method for storing a superabsorbent polymer of a gaseous or liquid gas precursor in focused charged particle beam devices.
Dependencies are inferred from the claim text.