Electrostatic chuck having extended lifetime
AssigneeApplied Materials, Inc.
InventorMitsutoshi Fukada
Life of this patent
Estimating the term…
Abstract
Embodiments of substrate supports for use in process chambers are provided herein. In some embodiments, a substrate support includes: an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein the ESC includes a plurality of backside gas openings extending through the ESC and terminating within at least some of the plurality of trenches; and one or more chucking electrodes disposed in the ESC.
Claims19
A substrate support, comprising:
- an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein each trench of the plurality of trenches extends in a linear manner across the upper surface, wherein the ESC includes a plurality of backside gas openings extending through the ESC and terminating within at least some of the plurality of trenches, and wherein each mesa of the plurality of mesas includes a trench of the plurality of trenches extending adjacent thereto;
- and
- one or more chucking electrodes disposed in the ESC.
A substrate support, comprising:
- an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein the plurality of trenches extend in a linear manner across the upper surface in multiple directions to form an orthogonal grid, wherein the ESC includes a plurality of backside gas openings extending through the ESC along two or more rings and terminating within at least some of the plurality of trenches;
- and
- one or more chucking electrodes disposed in the ESC.
A process chamber, comprising:
- a chamber body defining an interior volume therein;
- and
- a substrate support disposed in the interior volume, the substrate support comprising:
- an electrostatic chuck (ESC) having an upper surface and a plurality of mesas extending upward from the upper surface and a plurality of trenches extending downward from the upper surface and into the ESC, wherein each trench of the plurality of trenches extends in a linear manner across the upper surface, wherein the ESC includes a plurality of backside gas openings extending through the ESC and terminating within at least some of the plurality of trenches, wherein each mesa of the plurality of mesas includes a trench of the plurality of trenches extending adjacent thereto, and one or more chucking electrodes disposed in the ESC.
Dependencies are inferred from the claim text.