G03F 7/09
Characterised by structural details
Official title: characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N)
G03F7/09 (Characterised by structural details) appears on 5,383 US grants and 5,879 published applications in this corpus.
Search patents in G03F- Granted patents
- 5,383
- Published applications
- 5,879
- Assignees
- 1,034
- Inventors
- 8,958
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 18 | 0 |
| 1977 | 9 | 0 |
| 1978 | 13 | 0 |
| 1979 | 11 | 0 |
| 1980 | 24 | 0 |
| 1981 | 42 | 0 |
| 1982 | 30 | 0 |
| 1983 | 31 | 0 |
| 1984 | 30 | 0 |
| 1985 | 42 | 0 |
| 1986 | 50 | 0 |
| 1987 | 46 | 0 |
| 1988 | 33 | 0 |
| 1989 | 52 | 0 |
| 1990 | 49 | 0 |
| 1991 | 52 | 0 |
| 1992 | 38 | 0 |
| 1993 | 61 | 0 |
| 1994 | 77 | 0 |
| 1995 | 47 | 0 |
| 1996 | 65 | 0 |
| 1997 | 80 | 0 |
| 1998 | 103 | 0 |
| 1999 | 111 | 0 |
| 2000 | 97 | 0 |
| 2001 | 121 | 41 |
| 2002 | 114 | 131 |
| 2003 | 106 | 135 |
| 2004 | 106 | 161 |
| 2005 | 86 | 163 |
| 2006 | 96 | 204 |
| 2007 | 99 | 211 |
| 2008 | 114 | 227 |
| 2009 | 112 | 192 |
| 2010 | 154 | 186 |
| 2011 | 124 | 173 |
| 2012 | 158 | 225 |
| 2013 | 176 | 235 |
| 2014 | 262 | 283 |
| 2015 | 261 | 281 |
| 2016 | 241 | 278 |
| 2017 | 226 | 312 |
| 2018 | 195 | 224 |
| 2019 | 237 | 281 |
| 2020 | 197 | 301 |
| 2021 | 156 | 267 |
| 2022 | 175 | 280 |
| 2023 | 182 | 298 |
| 2024 | 176 | 278 |
| 2025 | 186 | 291 |
| 2026 | 112 | 221 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/11Having cover layers or intermediate layers1,888
- G03F 7/091Characterised by antireflection means or light filtering or absorbing means1,761
- G03F 7/094Multilayer resist systems1,117
- G03F 7/095Having more than one photosensitive layer795
- G03F 7/105Having substances646
- G03F 7/092Characterised by backside coating or layers, by lubricating-slip layers or means, by258
- G03F 7/093Characterised by antistatic means109
- G03F 7/115Having supports or layers with means for obtaining a screen effect or70
Recent patents
- EUV resist underlayer film-forming composition6 Oct 2026US 12,754,479 B2Nissan Chemical Corporation
- Hardmask composition, hardmask layer, and pattern forming method6 Oct 2026US 12,754,481 B2Samsung SDI.Co., Ltd.
- Resist underlayer film-forming composition containing terminal-blocked reaction product22 Sep 2026US 12,743,019 B2Nissan Chemical Corporation
- Method for coating top anti-reflective coating15 Sep 2026US 12,736,880 B2United Semiconductor (Xiamen) Co., Ltd.
- Providing a barrier layer for photoresist processing15 Sep 2026US 12,736,881 B2Tokyo Electron Limited
- Lithography method8 Oct 2026US 2026/0310079 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Wet removable silicon-containing resist underlayer film-forming composition8 Oct 2026US 2026/0310080 A1Nissan Chemical Corporation
- Resist underlayer film-forming composition8 Oct 2026US 2026/0310081 A1Nissan Chemical Corporation
- Lithography method8 Oct 2026US 2026/0310082 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Wet-removable silicon-containing resist underlayer film-forming composition8 Oct 2026US 2026/0314341 A1Nissan Chemical Corporation
Most cited
By later US patents
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- Radiation patternable CVD film460US 8,465,903 B2APPLIED Materials.Inc. · 2013
- Lithography patterning with a gas phase resist422US 10,018,920 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Atomic layer deposition of photoresist materials and hard mask precursors382US 8,536,068 B2APPLIED Materials.Inc. · 2013
- Method of forming a pattern using polysilane371US 6,025,117 AKabushiki Kaisha Toshiba · 2000