Method for coating top anti-reflective coating
AssigneeUnited Semiconductor (Xiamen) Co., Ltd.
InventorsDian Han Liu, Maohua Ren, Yuan-Chi Pai, Wen Yi Tan
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Abstract
The invention provides a method for coating top anti-reflective coating (TARC), which comprises the following steps: providing a turntable, placing a substrate above the turntable with a photoresist layer on the substrate, spraying deionized water on the photoresist layer, spraying a top anti-reflective coating liquid on the deionized water to mix the top anti-reflective coating liquid with the deionized water to form a mixed liquid, and performing a spin coating step to spin-coat and disperse the mixed liquid to form a top anti-reflective coating film on the photoresist layer.
Claims13
A method of coating a top antireflective coating, comprising:
- providing a turntable, placing a substrate on the turntable with a photoresist layer on the substrate;
- spraying a deionized water on the photoresist layer;
- spraying a top anti-reflective coating liquid on the deionized water to mix the top anti-reflective coating liquid with the deionized water to form a mixed liquid;
- and
- performing a spin coating step to spin-coat and disperse the mixed liquid to form a top anti-reflective coating film on the photoresist layer;
- and
- performing a baking step after coating the mixed liquid on the surface of the photoresist layer, wherein after the baking step is performed, a central region of the photoresist layer contains a cavity therein, and the cavity is located under the top anti-reflective coating film.
A method of coating a top antireflective coating, comprising:
- providing a turntable, placing a substrate on the turntable with a photoresist layer on the substrate;
- spraying a deionized water on the photoresist layer, wherein the spraying position of the deionized water is at a first offset position, which is at a unit distance next to a central point of the photoresist layer, and when the deionized water is sprayed on the surface of the photoresist layer, the turntable simultaneously performs an instantaneous rotation step;
- spraying a top anti-reflective coating liquid on the deionized water to mix the top anti-reflective coating liquid with the deionized water to form a mixed liquid;
- and
- performing a spin coating step to spin coat and disperse the mixed liquid to form an anti-reflective coating film on the photoresist layer.
Dependencies are inferred from the claim text.