G03F 7/091
Characterised by antireflection means or light filtering or absorbing means
Official title: {characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement}
G03F7/091 (Characterised by antireflection means or light filtering or absorbing means) appears on 1,761 US grants and 1,759 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,761
- Published applications
- 1,759
- Assignees
- 379
- Inventors
- 2,938
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 4 | 0 |
| 1984 | 1 | 0 |
| 1985 | 4 | 0 |
| 1986 | 9 | 0 |
| 1987 | 9 | 0 |
| 1988 | 6 | 0 |
| 1989 | 16 | 0 |
| 1990 | 11 | 0 |
| 1991 | 13 | 0 |
| 1992 | 12 | 0 |
| 1993 | 16 | 0 |
| 1994 | 23 | 0 |
| 1995 | 15 | 0 |
| 1996 | 27 | 0 |
| 1997 | 38 | 0 |
| 1998 | 51 | 0 |
| 1999 | 46 | 0 |
| 2000 | 47 | 0 |
| 2001 | 63 | 21 |
| 2002 | 57 | 72 |
| 2003 | 53 | 65 |
| 2004 | 50 | 77 |
| 2005 | 50 | 77 |
| 2006 | 55 | 90 |
| 2007 | 54 | 83 |
| 2008 | 55 | 93 |
| 2009 | 53 | 74 |
| 2010 | 71 | 73 |
| 2011 | 47 | 62 |
| 2012 | 67 | 62 |
| 2013 | 55 | 53 |
| 2014 | 74 | 63 |
| 2015 | 70 | 76 |
| 2016 | 64 | 71 |
| 2017 | 60 | 100 |
| 2018 | 54 | 51 |
| 2019 | 70 | 57 |
| 2020 | 47 | 58 |
| 2021 | 38 | 50 |
| 2022 | 45 | 53 |
| 2023 | 45 | 63 |
| 2024 | 40 | 81 |
| 2025 | 42 | 83 |
| 2026 | 24 | 51 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for coating top anti-reflective coating15 Sep 2026US 12,736,880 B2United Semiconductor (Xiamen) Co., Ltd.
- Composition for forming resist underlayer film1 Sep 2026US 12,724,347 B2Nissan Chemical Corporation
- Photosensitive composition25 Aug 2026US 12,717,234 B2Xsys Germany GmbH
- Method and apparatus of multi-modal illumination and display for improved color rendering, power efficiency, health and eye-safety14 Jul 2026US 12,682,857 B2PixelDisplay, Inc.
- Bottom antireflective coating materials7 Jul 2026US 12,675,046 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Antireflective polymer and hardmask composition including the same27 Aug 2026US 2026/0251976 A1Chempole Co., Ltd.
- Silicon-containing resist underlayer film-forming composition20 Aug 2026US 2026/0244105 A1Nissan Chemical Corporation
- Patterned substrate pre-wetting composition, use of pre-wetting composition for application directly onto patterned substrate, method for manufacturing resist pattern, method for manufacturing processed substrate, and method for manufacturing device13 Aug 2026US 2026/0235948 A1Merck Patent GmbH
- Positive-type multilayer molecular film photoresist having molecular line structure13 Aug 2026US 2026/0235955 A1Samsung Electronics Co., Ltd.
- Coating agent composition for nitrogen-atom-containing substrate13 Aug 2026US 2026/0235956 A1Nissan Chemical Corporation
Most cited
By later US patents
- Method of forming a pattern using polysilane371US 6,025,117 AKabushiki Kaisha Toshiba · 2000
- Bilayer metallization cap for photolithography286US 5,219,788 AIBM Corporation · 1993
- Method for forming a dielectric tantalum nitride layer as an anti-reflective coating (ARC)232US 5,741,626 AMotorola, Inc. · 1998
- Anti-reflective coating227US 4,910,122 ABrewer Science Inc. · 1990
- Method of forming fine pattern203US 6,586,163 B1ASM Japan K .K. · 2003