Silicon-containing resist underlayer film-forming composition
AssigneeNissan Chemical Corporation
InventorsTaiki SAIJO, Wataru SHIBAYAMA
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Abstract
A silicon-containing resist underlayer film-forming composition including: a polysiloxane as a component [A]; and a solvent as a component [C], in which the polysiloxane contains a constituent unit derived from a hydrolyzable silane (A) having at least one of an arylsulfonyl group having an iodine atom directly bonded to an aromatic ring or an arylthioester group having an iodine atom directly bonded to an aromatic ring.
Claims24
A silicon-containing resist underlayer film-forming composition comprising:
- a polysiloxane as a component [A];
- and
- a solvent as a component [C], wherein
- the polysiloxane contains a constituent unit derived from a hydrolyzable silane (A) having at least one of an arylsulfonyl group having an iodine atom directly bonded to an aromatic ring or an arylthioester group having an iodine atom directly bonded to an aromatic ring.
A silicon-containing resist underlayer film-forming composition comprising:
- a polysiloxane as a component [A′];
- a hydrolyzable silane (A) having at least one of an arylsulfonyl group having an iodine atom directly bonded to an aromatic ring or an arylthioester group having an iodine atom directly bonded to an aromatic ring as a component [B];
- and
- a solvent as a component [C].
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A hydrolyzable silane comprising at least one of an arylsulfonyl group having an iodine atom directly bonded to an aromatic ring or an arylthioester group having an iodine atom directly bonded to an aromatic ring.
Dependencies are inferred from the claim text.