Wet-removable silicon-containing resist underlayer film-forming composition

A silicon-containing resist underlayer film-forming composition for forming a silicon-containing resist underlayer film containing a hydrolysis-condensation compound of a hydrolyzable silane mixture containing a hydrolyzable silane represented by Formula (1-1) below and a hydrolyzable silane represented by Formula (2) below and soluble in a basic chemical solution, the composition containing:

• a hydrolyzable silane represented by Formula (1-1)
• (in Formula (1-1),
• R13 is a group or an atom bonded to a silicon atom, and each independently represents a hydroxy group, an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom);
• and
• a hydrolyzable silane represented by Formula (2)
• (in Formula (2),
• R1 is a group bonded to a silicon atom, and represents an organic group containing a succinic anhydride skeleton,
• R2 is a group bonded to a silicon atom, and each independently represents an optionally substituted alkyl group, an optionally substituted halogenated alkyl group, or an optionally substituted alkoxyalkyl group, or represents an organic group containing an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, an amide group, an alkoxy group, a sulfonyl group, or a cyano group, or a combination of two or more thereof,
• R3 is a group or an atom bonded to a silicon atom, and each independently represents an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom,
• j represents 1, h represents an integer of 0 to 2, and 4-(j+h) represents an integer of 1 to 3).