G03F 7/115
Having supports or layers with means for obtaining a screen effect or
Official title: having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
G03F7/115 (Having supports or layers with means for obtaining a screen effect or) appears on 70 US grants and 18 published applications in this corpus.
Search patents in G03F- Granted patents
- 70
- Published applications
- 18
- Assignees
- 36
- Inventors
- 173
- Latest grant
- 30 Jan 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 4 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 7 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 10 | 0 |
| 1986 | 6 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 1 |
| 2003 | 5 | 0 |
| 2004 | 1 | 1 |
| 2005 | 0 | 1 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 1 |
| 2018 | 2 | 2 |
| 2019 | 0 | 2 |
| 2020 | 0 | 1 |
| 2021 | 0 | 2 |
| 2022 | 1 | 0 |
| 2023 | 0 | 1 |
| 2024 | 1 | 1 |
| 2025 | 0 | 0 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device30 Jan 2024US 11,886,113 B2FUJIFILM Corporation
- Photosensitive resin composition, photosensitive resin laminate, and pattern forming process5 Apr 2022US 11,294,283 B2Shin-Etsu Chemical Co., Ltd.
- Image transfer using EUV lithographic structure and double patterning process24 Jul 2018US 10,032,633 B1International Business Machines Corporation
- Photo-curable and thermo-curable resin composition and dry film solder resist30 Jan 2018US 9,880,467 B2LG Chem.Ltd.
- Photomask, method of generating resist pattern, and method of fabricating master information carrier23 Nov 2004US 6,821,869 B2Matsushita Electric Industrial Co., Ltd.
- Pattern forming method27 Aug 2026US 2026/0251978 A1
- Photosensitive resin composition, photosensitive element, printed wiring board, and method for manufacturing printed wiring board15 Jan 2026US 2026/0016749 A1
- Photosensitive resin composition, photosensitive element, printed wiring board, and method for producing printed wiring board10 Oct 2024US 2024/0337934 A1
- Photosensitive resin multilayer body23 Nov 2023US 2023/0375930 A1Asahi Kasei Kabushiki Kaisha
- Substrate, a substrate holder, a substrate coating apparatus, a method for coating the substrate and a method for removing the coating22 Jul 2021US 2021/0223696 A1ASML Netherlands B. V.
Most cited
By later US patents
- Oxygen barrier layers for photopolymerizable elements73US 4,072,527 AE. I. Du Pont de Nemours and Company · 1978
- Light-sensitive printing plate with matt overlayer33US 4,168,979 AFuji Photo Film Co., Ltd. · 1979
- Photosensitive printing plate forming material having a novel matting layer composition24US 4,238,560 AFuji Photo Film Co., Ltd. · 1980
- Lithographic printing method using a low surface energy layer21US 6,300,042 B1Motorola, Inc. · 2001
- Oxygen barrier layers for photopolymerizable elements20US 4,072,528 AE. I. Du Pont de Nemours and Company · 1978