US 11,886,113 B2 · Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Abstract

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having an excellent pattern collapse suppressing property and excellent LWR performance can be obtained. In addition, the present invention also provides a resist film, a pattern forming method, and a method for manufacturing an electronic device, each regarding the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin whose solubility in a developer is changed by the action of an acid, a photoacid generator represented by General Formula (b1), and a solvent, in which the photoacid generator represented by General Formula (b1) is a compound that generates an acid having a pka of 1.0 or less upon irradiation with actinic rays or radiation

Claims15

Dependent claims

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

a resin whose solubility in a developer is changed by the action of an acid;
and
a photoacid generator represented by General Formula (b1),
wherein the photoacid generator represented by General Formula (b1) is a compound that generates an acid having a pka of 1.0 or less upon irradiation with actinic rays or radiation,
in General Formula (b1),
R1 represents a substituent,
R2 represents a group forming a having at least one heteroatom other than S+, which may have a substituent, together with S+, and
an aromatic ring group is not disposed at at least one of a position bonded to S+ in R1 and two positions bonded to S+ in R2,
provided that the substituent represented by R1 has an anionic group which is a group having a sulfonate anion group or the group represented by R2 has an anionic group which is a group having a sulfonate anion group.

6 more elements

Dependencies are inferred from the claim text.

Facts

Application

17/002,911Filed 26 Aug 2020 · continuation

Priority

JP 2018-0368431 Mar 2018

Published

US 2020/0393756 A117 Dec 2020

Granted

30 Jan 2024

Term ends

Not estimatedThe source records don’t support an estimate.

Classification23 codes

G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
C07C 381/12
Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00: sulfonium compounds
C07D 295/26
With hetero atoms directly attached to ring nitrogen atoms: sulfur atoms
C07D 327/08
Six-membered rings: [b,e]-condensed with two six-membered carbocyclic rings

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Life of this patent

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Life of this patent

Abstract

Claims15