G03F 7/094
Multilayer resist systems
Official title: {Multilayer resist systems, e.g. planarising layers}
G03F7/094 (Multilayer resist systems) appears on 1,117 US grants and 1,459 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,117
- Published applications
- 1,459
- Assignees
- 303
- Inventors
- 2,247
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 4 | 0 |
| 1982 | 1 | 0 |
| 1983 | 6 | 0 |
| 1984 | 10 | 0 |
| 1985 | 15 | 0 |
| 1986 | 14 | 0 |
| 1987 | 10 | 0 |
| 1988 | 7 | 0 |
| 1989 | 10 | 0 |
| 1990 | 10 | 0 |
| 1991 | 10 | 0 |
| 1992 | 14 | 0 |
| 1993 | 11 | 0 |
| 1994 | 17 | 0 |
| 1995 | 6 | 0 |
| 1996 | 10 | 0 |
| 1997 | 11 | 0 |
| 1998 | 12 | 0 |
| 1999 | 14 | 0 |
| 2000 | 10 | 0 |
| 2001 | 10 | 4 |
| 2002 | 5 | 14 |
| 2003 | 16 | 17 |
| 2004 | 13 | 22 |
| 2005 | 14 | 19 |
| 2006 | 9 | 17 |
| 2007 | 8 | 18 |
| 2008 | 14 | 13 |
| 2009 | 14 | 5 |
| 2010 | 14 | 11 |
| 2011 | 5 | 13 |
| 2012 | 9 | 37 |
| 2013 | 18 | 48 |
| 2014 | 42 | 59 |
| 2015 | 52 | 67 |
| 2016 | 62 | 71 |
| 2017 | 55 | 77 |
| 2018 | 56 | 63 |
| 2019 | 76 | 105 |
| 2020 | 64 | 104 |
| 2021 | 60 | 96 |
| 2022 | 62 | 86 |
| 2023 | 57 | 102 |
| 2024 | 64 | 114 |
| 2025 | 69 | 154 |
| 2026 | 40 | 123 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Composition for forming organic film, patterning process, and compound and polymer for forming organic film8 Sep 2026US 12,730,377 B2Shin-Etsu Chemical Co., Ltd.
- Photoresist underlayer and method of manufacturing a semiconductor device8 Sep 2026US 12,730,378 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Composition for forming resist underlayer film1 Sep 2026US 12,724,347 B2Nissan Chemical Corporation
- Resist underlayer compositions and pattern formation methods using such compositions11 Aug 2026US 12,704,778 B2Dupont Electronic Materials International, LLC
- Semiconductor device and method of manufacture28 Jul 2026US 12,696,733 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography method8 Oct 2026US 2026/0310079 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography method8 Oct 2026US 2026/0310082 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Composition for forming surface-modified layer, and resist pattern-forming method1 Oct 2026US 2026/0299420 A1Tokyo Ohka Kogyo.Co., Ltd.
- Semiconductor method of manufacture and layer composition1 Oct 2026US 2026/0299424 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for manufacturing semiconductor used resist with magnetic materials in line/space pattern1 Oct 2026US 2026/0299427 A1Nanya Technology Corporation
Most cited
By later US patents
- Radiation patternable CVD film460US 8,465,903 B2APPLIED Materials.Inc. · 2013
- Atomic layer deposition of photoresist materials and hard mask precursors382US 8,536,068 B2APPLIED Materials.Inc. · 2013
- PECVD films for EUV lithography291US 9,618,846 B2Lam Research Corporation · 2017
- High resolution, multi-layer resist for microlithography and method therefor261US 5,314,772 AArizona Board of Regents · 1994
- Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers223US 5,190,637 AWisconsin Alumni Research Foundation · 1993