Composition for forming organic film, patterning process, and compound and polymer for forming organic film
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsDaisuke Kori, Naoki Kobayashi
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsDaisuke Kori, Naoki Kobayashi
Estimating the term…
An organic film forming composition, containing: a material shown by formula (I) and/or (II); and an organic solvent, where R1 and R4 each represent a hydrogen atom, an allyl or propargyl group, R2 and R5 each represent a substituent, R3 and R6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, or an alkenyl group having 2 to 4 carbon atoms. “m” and “i” represent 0 or 1, “k” and “q” represent an integer of 0 to 2, “n” represent 1 or 2, “h”, and “j” represent an integer of 0 to 2 and satisfy the relationship 1≤h+j≤4, and “l” and “r” represent 0 or 1. W represents a single bond or divalent group shown by formulae (3). Each V independently represents a hydrogen atom or linking moiety.
A composition for forming an organic film, comprising:
A composition for forming an organic film, comprising:
A polymer having a repeating unit shown by the following general formula (4),
A compound shown by the following general formula (1),
A compound shown by the following general formula (2),
A polymer having a repeating unit shown by the following general formula (5),
Dependencies are inferred from the claim text.