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US 2026/0310080 A1Published application
Wet removable silicon-containing resist underlayer film-forming composition
AssigneeNissan Chemical Corporation
InventorsShuhei SHIGAKI, Wataru SHIBAYAMA
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Abstract
A silicon-containing resist underlayer film-forming composition containing a hydrolysis condensate of a hydrolyzable silane mixture and an organic solvent, wherein at least a part of silanol groups in the hydrolysis condensate is capped with an alcohol-based compound, which is a composition for forming a silicon-containing resist underlayer film soluble in a basic chemical solution.
Claims15
A silicon-containing resist underlayer film-forming composition comprising a hydrolysis condensate of a hydrolyzable silane mixture and an organic solvent, wherein
- at least a part of silanol groups in the hydrolysis condensate is capped with an alcohol-based compound,
- which is a composition for forming a silicon-containing resist underlayer film soluble in a basic chemical solution.
Dependencies are inferred from the claim text.