G03F 7/095
Having more than one photosensitive layer
Official title: having more than one photosensitive layer (G03F7/075 takes precedence)
G03F7/095 (Having more than one photosensitive layer) appears on 795 US grants and 764 published applications in this corpus.
Search patents in G03F- Granted patents
- 795
- Published applications
- 764
- Assignees
- 327
- Inventors
- 1,884
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 4 | 0 |
| 1978 | 3 | 0 |
| 1979 | 4 | 0 |
| 1980 | 8 | 0 |
| 1981 | 12 | 0 |
| 1982 | 14 | 0 |
| 1983 | 9 | 0 |
| 1984 | 6 | 0 |
| 1985 | 10 | 0 |
| 1986 | 12 | 0 |
| 1987 | 8 | 0 |
| 1988 | 7 | 0 |
| 1989 | 13 | 0 |
| 1990 | 13 | 0 |
| 1991 | 7 | 0 |
| 1992 | 6 | 0 |
| 1993 | 12 | 0 |
| 1994 | 14 | 0 |
| 1995 | 10 | 0 |
| 1996 | 6 | 0 |
| 1997 | 5 | 0 |
| 1998 | 12 | 0 |
| 1999 | 24 | 0 |
| 2000 | 15 | 0 |
| 2001 | 21 | 7 |
| 2002 | 22 | 15 |
| 2003 | 10 | 17 |
| 2004 | 15 | 25 |
| 2005 | 5 | 25 |
| 2006 | 11 | 31 |
| 2007 | 18 | 25 |
| 2008 | 17 | 24 |
| 2009 | 14 | 27 |
| 2010 | 14 | 24 |
| 2011 | 15 | 25 |
| 2012 | 23 | 25 |
| 2013 | 31 | 37 |
| 2014 | 40 | 36 |
| 2015 | 33 | 27 |
| 2016 | 26 | 20 |
| 2017 | 25 | 42 |
| 2018 | 14 | 28 |
| 2019 | 36 | 37 |
| 2020 | 29 | 38 |
| 2021 | 21 | 37 |
| 2022 | 24 | 47 |
| 2023 | 25 | 34 |
| 2024 | 21 | 27 |
| 2025 | 32 | 50 |
| 2026 | 15 | 34 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Photosensitive composition25 Aug 2026US 12,717,234 B2Xsys Germany GmbH
- Semiconductor device and method of manufacture28 Jul 2026US 12,696,733 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photoresist, method of manufacturing a semiconductor device and method of extreme ultraviolet lithography26 May 2026US 12,638,771 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography techniques for reducing defects5 May 2026US 12,619,154 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method of forming photoresist pattern, and photoresist structure21 Apr 2026US 12,607,935 B2Changxin Memory Technologies, Inc.
- Fabrication method of high-aspect-ratio double-layer diamond nanostructure17 Sep 2026US 2026/0275574 A1Institute of Physics, Chinese Academy of Sciences
- Thermal acid generators, coating compositions, and pattern formation methods20 Aug 2026US 2026/0244096 A1
- Silicon-containing resist underlayer film-forming composition having carbon-carbon double bond20 Aug 2026US 2026/0244104 A1Nissan Chemical Corporation
- Silicon-containing resist underlayer film-forming composition20 Aug 2026US 2026/0244105 A1Nissan Chemical Corporation
- Positive-type multilayer molecular film photoresist having molecular line structure13 Aug 2026US 2026/0235955 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Process of doping silver image in chalcogenide layer193US 4,269,935 AIonomet Company, Inc. · 1981
- Method for providing side shields for a magnetic recording transducer153US 8,703,397 B1Western Digital (Fremont), LLC · 2014
- Process for preparing an overcoated photopolymer printing plate125US 4,427,759 AE. I. Du Pont de Nemours and Company · 1984
- Method of forming images122US 4,849,320 ACiba-Geigy Corporation · 1989
- Antireflective coating compositions comprising photoacid generators121US 5,939,236 AShipley Company, L.L.C. · 1999