Back to results
US 5,939,236 AGranted
Antireflective coating compositions comprising photoacid generators
AssigneeShipley Company, L.L.C.
InventorsEdward K. Pavelchek, Manuel DoCanto
Life of this patent
Estimating the term…
Abstract
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
Claims29
A coated substrate comprising:
- a substrate having thereon
- 1) a coating layer of an antireflective composition that comprises a) a resin binder, b) an acid or thermal acid generator, and c) a photoacid generator compound;
- and
- 2) a coating layer of a photoresist over the antireflective composition coating layer, the photoresist comprising a resin and a photoacid generator compound.
1 more element
A coated substrate comprising:
- a substrate having thereon
- 1) a coating layer of an antireflective composition comprising a resin binder, and a photoacid generator, the antireflective composition at least essentially free of a crosslinker component;
- and
- 2) a coating layer of a chemically-amplified positive-acting photoresist over the antireflective composition coating layer, the photoresist comprising a resin and a photoacid generator compound.
1 more element
Dependencies are inferred from the claim text.