Silicon-containing resist underlayer film-forming composition having carbon-carbon double bond

A silicon-containing resist underlayer film-forming composition comprising:

• component [A]:
• a polysiloxane;
• and
• component [C]:
• a solvent,
• wherein
• the polysiloxane contains a constituent unit derived from a hydrolyzable silane (A) represented by Formula (A-1) below:
• in the Formula (A-1), a and b each independently represent an integer of 1 to 3,
• c represents an integer of 0 to 2,
• b+c represents an integer of 1 to 3,
• R1 represents a group represented by Formula (A-1-1) below,
• R2 represents a (a+1)-valent group having no ring structure or a (a+1)-valent group having an aromatic hydrocarbon ring,
• R3 represents an optionally substituted alkyl group, an optionally substituted aryl group, an optionally substituted aralkyl group, an optionally substituted halogenated alkyl group, an optionally substituted halogenated aryl group, an optionally substituted halogenated aralkyl group, an optionally substituted alkoxyalkyl group, an optionally substituted alkoxyaryl group or an optionally substituted alkoxyaralkyl group, or an organic group having an epoxy group, an organic group having a mercapto group, an organic group having an amino group, an organic group having an alkoxy group, an organic group having a sulfonyl group or an organic group having a cyano group, or a combination of two or more thereof,
• X represents an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom, and
• for a plurality of R1, R2, R3, and X, the plurality of R1, R2, R3, and X may be same or different,
• in the Formula (A-1-1), R11 represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms, R12 represents a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or a halogen atom, and * represents a bonding hand.