C23C 16/48
By irradiation
Official title: by irradiation, e.g. photolysis, radiolysis, particle radiation
C23C16/48 (By irradiation) appears on 1,233 US grants and 1,126 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,233
- Published applications
- 1,126
- Assignees
- 550
- Inventors
- 2,782
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 6 | 0 |
| 1983 | 5 | 0 |
| 1984 | 9 | 0 |
| 1985 | 19 | 0 |
| 1986 | 14 | 0 |
| 1987 | 24 | 0 |
| 1988 | 20 | 0 |
| 1989 | 29 | 0 |
| 1990 | 26 | 0 |
| 1991 | 18 | 0 |
| 1992 | 32 | 0 |
| 1993 | 23 | 0 |
| 1994 | 20 | 0 |
| 1995 | 26 | 0 |
| 1996 | 27 | 0 |
| 1997 | 28 | 0 |
| 1998 | 43 | 0 |
| 1999 | 28 | 0 |
| 2000 | 54 | 0 |
| 2001 | 40 | 13 |
| 2002 | 40 | 50 |
| 2003 | 36 | 30 |
| 2004 | 20 | 35 |
| 2005 | 27 | 47 |
| 2006 | 23 | 48 |
| 2007 | 13 | 33 |
| 2008 | 16 | 20 |
| 2009 | 20 | 23 |
| 2010 | 10 | 47 |
| 2011 | 16 | 31 |
| 2012 | 20 | 38 |
| 2013 | 20 | 53 |
| 2014 | 30 | 39 |
| 2015 | 27 | 64 |
| 2016 | 33 | 77 |
| 2017 | 48 | 49 |
| 2018 | 42 | 46 |
| 2019 | 45 | 48 |
| 2020 | 43 | 48 |
| 2021 | 32 | 43 |
| 2022 | 35 | 53 |
| 2023 | 35 | 44 |
| 2024 | 38 | 57 |
| 2025 | 39 | 56 |
| 2026 | 30 | 34 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- C23C 16/481By radiant heating of the substrate454
- C23C 16/482Using incoherent light, uv to ir369
- C23C 16/483Using coherent light, uv to ir240
- C23C 16/486Using ion beam radiation124
- C23C 16/487Using electron radiation84
- C23C 16/488Protection of windows for introduction of radiation into the coating chamber55
- C23C 16/484Using x-ray radiation19
- C23C 16/485Using synchrotron radiation5
Recent patents
- Substrate processing module and laser beam providing method29 Sep 2026US 12,749,663 B2Semes Co., Ltd.
- Methods of forming structures, semiconductor processing systems, and semiconductor device structures22 Sep 2026US 12,742,242 B2ASM IP Holding B. V.
- Multi-zone lamp heating for chemical vapor deposition25 Aug 2026US 12,721,089 B2APPLIED Materials.Inc.
- Jig for alignment in relation to a process chamber, and related apparatus, systems, and methods11 Aug 2026US 12,703,918 B2APPLIED Materials.Inc.
- Semiconductor processing chamber, semiconductor processing equipment and vapor epitaxy equipment4 Aug 2026US 12,698,571 B2Advanced Micro-Fabrication Equipment Inc. China
- Plasma and Photon assisted Metal-Organic Chemical Vapor Deposition24 Sep 2026US 2026/0286510 A1PhantaField Inc.
- Upper liner ring for vapor deposition process chamber10 Sep 2026US 2026/0265907 A1Beijing Naura Microelectronics Equipment Co., Ltd.
- Flash-enhanced atomic layer deposition and chemical vapor deposition of metals10 Sep 2026US 2026/0265909 A1Lam Research Corporation
- Secondary translating susceptor for superconductor manufacturing10 Sep 2026US 2026/0265918 A1MetOx Technologies, Inc.
- Article comprising a nanolaminate coating13 Aug 2026US 2026/0235793 A1Corporation De L'ecole Polytechnique De Montreal
Most cited
By later US patents
- Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween832US 5,781,693 AAPPLIED Materials.Inc. · 1998
- Photo-assisted CVD apparatus791US 5,527,417 AKabushiki Kaisha Toshiba · 1996
- Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)717US 6,428,859 B1Angstron Systems, Inc. · 2002
- Substrate platform for a semiconductor substrate during rapid high temperature processing and method of supporting a substrate678US 6,090,212 AMicro C Technologies, Inc. · 2000
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995