C23C 16/488
Protection of windows for introduction of radiation into the coating chamber
Official title: {Protection of windows for introduction of radiation into the coating chamber}
C23C16/488 (Protection of windows for introduction of radiation into the coating chamber) appears on 55 US grants and 34 published applications in this corpus.
Search patents in C23C- Granted patents
- 55
- Published applications
- 34
- Assignees
- 44
- Inventors
- 164
- Latest grant
- 23 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 6 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 4 | 0 |
| 1994 | 3 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 1 |
| 2002 | 2 | 1 |
| 2003 | 1 | 3 |
| 2004 | 0 | 0 |
| 2005 | 1 | 0 |
| 2006 | 1 | 5 |
| 2007 | 0 | 1 |
| 2008 | 1 | 0 |
| 2009 | 1 | 0 |
| 2010 | 2 | 3 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 2 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 2 |
| 2016 | 0 | 1 |
| 2017 | 0 | 0 |
| 2018 | 1 | 1 |
| 2019 | 1 | 2 |
| 2020 | 1 | 2 |
| 2021 | 1 | 1 |
| 2022 | 2 | 5 |
| 2023 | 0 | 0 |
| 2024 | 1 | 2 |
| 2025 | 1 | 3 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Radiation shield23 Sep 2025US 12,424,464 B2ASM IP Holding B. V.
- Window for chemical vapor deposition systems and related methods10 Sep 2024US 12,084,770 B2GlobalWafers Co., Ltd.
- Cleaning method1 Nov 2022US 11,488,813 B2Tokyo Electron Limited
- Radiation shield16 Aug 2022US 11,417,545 B2ASM IP Holding B. V.
- Window member for an x-ray device17 Aug 2021US 11,094,494 B2Oxford Instruments X-ray Technology, Inc.
- Radiation shield12 Feb 2026US 2026/0047378 A1ASM IP Holding B. V.
- Illumination device for film growth process and film growth process equipment25 Sep 2025US 2025/0297365 A1National Tsing Hua University
- Multi-zone lamp heating and temperature monitoring in epitaxy process chamber31 Jul 2025US 2025/0246461 A1APPLIED Materials.Inc.
- Multi-substrate processing system30 Jan 2025US 2025/0034708 A1APPLIED Materials.Inc.
- Window for chemical vapor deposition systems and related methods5 Dec 2024US 2024/0401201 A1GlobalWafers Co., Ltd.
Most cited
By later US patents
- Photo-assisted CVD apparatus791US 5,527,417 AKabushiki Kaisha Toshiba · 1996
- Photochemical vapor phase reaction apparatus and method of causing a photochemical vapor phase reaction583US 5,288,684 ASemiconductor Energy Laboratory Co.Ltd. · 1994
- Apparatus and method for photochemical vapor deposition572US 4,654,226 AUniversity of Delaware · 1987
- Method for forming silicon-containing materials during a photoexcitation deposition process535US 7,651,955 B2APPLIED Materials.Inc. · 2010
- Photo CVD apparatus with a glow discharge system532US 5,183,511 ASemiconductor Energy Laboratory Co.Ltd. · 1993