Window for chemical vapor deposition systems and related methods
AssigneeGlobalWafers Co., Ltd.
InventorsChun-Chin Tu, Manabu Hamano, Lunghsing Hsu
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AssigneeGlobalWafers Co., Ltd.
InventorsChun-Chin Tu, Manabu Hamano, Lunghsing Hsu
Estimating the term…
A window for a CVD system includes a processing chamber defining a gas inlet introducing gas into the processing chamber and a gas outlet to allow the gas to exit the processing chamber. A substrate support is within the processing chamber and receives a substrate. A transparent upper window includes a convex first face spaced from the substrate support to define an air gap therebetween. The upper window is within the processing chamber to direct the gas from the gas inlet, through the air gap, and to the gas outlet. The first face includes a radially outer surface and a radially inner surface circumscribed within the outer surface. The outer surface has a first radius of curvature and the inner surface has a second radius of curvature that is different from the first radius of curvature.
A window for a chemical vapor deposition system, the chemical vapor deposition system including a chamber wall at least partially defining a processing chamber and a substrate support positioned within the processing chamber, the substrate support being configured to receive a substrate thereon, the window comprising:
A window for a chemical vapor deposition system, the window comprising:
Dependencies are inferred from the claim text.