Apparatus and method for photochemical vapor deposition
AssigneeUniversity of Delaware
InventorsScott C. Jackson, Richard E. Rocheleau
Life of this patent
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Abstract
A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.
Claims22
A photochemical vapor deposition apparatus for depositing selected materials on at least one substrate comprising a reactor housing, a window in one wall of said housing, a reaction chamber in said housing in the portion of said housing having said window whereby an ultraviolet light may be disposed outside said housing to pass UV radiation into said reaction chamber through said window, a transparent curtain dividing said reaction chamber into a reaction zone and a flush zone, substrate mounting means in said reaction zone in light communication with said window through said curtain, said reaction zone being formed by a base and a peripheral wall projecting outwardly from said base around said substrate mounting means, said curtain spanning said peripheral wall parallel to said base to seal said reaction zone from said flush zone, means for feeding a reactant gas to said reaction zone, means for withdrawing the reactant gas from said reaction zone, and means for flowing inert diluent gas into said flush zone and in the space between said window and said curtain.
A method of depositing selected materials on a substrate by photochemical vapor deposition, comprising mounting a substrate in the reaction chamber of a housing, dividing the reaction chamber into a reaction zone and a flush zone sealed from each other by a flexible transparent curtain, heating the substrate while flowing a reactant gas into and out of the reaction zone, directing UV radiation toward the substrate by an ultraviolet light which radiates through a window in the housing and through the curtain to create the photochemical vapor deposition, and flowing an inert diluent gas into the flush zone during the photochemical vapor deposition.
Dependencies are inferred from the claim text.