C23C 16/00
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of
Official title: Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C14/00)
C23C16/00 (Chemical coating by decomposition of gaseous compounds, without leaving reaction products of) appears on 30,392 US grants and 35,926 published applications in this corpus.
Search patents in C23C- Granted patents
- 30,392
- Published applications
- 35,926
- Assignees
- 5,590
- Inventors
- 47,912
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 48 | 0 |
| 1977 | 43 | 0 |
| 1978 | 44 | 0 |
| 1979 | 39 | 0 |
| 1980 | 52 | 0 |
| 1981 | 57 | 0 |
| 1982 | 78 | 0 |
| 1983 | 75 | 0 |
| 1984 | 108 | 0 |
| 1985 | 130 | 0 |
| 1986 | 126 | 0 |
| 1987 | 166 | 0 |
| 1988 | 166 | 0 |
| 1989 | 240 | 0 |
| 1990 | 258 | 0 |
| 1991 | 264 | 0 |
| 1992 | 291 | 0 |
| 1993 | 364 | 0 |
| 1994 | 405 | 0 |
| 1995 | 412 | 0 |
| 1996 | 414 | 0 |
| 1997 | 440 | 0 |
| 1998 | 533 | 0 |
| 1999 | 624 | 0 |
| 2000 | 855 | 0 |
| 2001 | 826 | 385 |
| 2002 | 846 | 1001 |
| 2003 | 808 | 1076 |
| 2004 | 767 | 1125 |
| 2005 | 664 | 1200 |
| 2006 | 555 | 1227 |
| 2007 | 529 | 1061 |
| 2008 | 508 | 1147 |
| 2009 | 516 | 1322 |
| 2010 | 746 | 1233 |
| 2011 | 743 | 1177 |
| 2012 | 763 | 1217 |
| 2013 | 808 | 1310 |
| 2014 | 904 | 1307 |
| 2015 | 979 | 1640 |
| 2016 | 1014 | 1643 |
| 2017 | 1143 | 1623 |
| 2018 | 1145 | 1605 |
| 2019 | 1308 | 1649 |
| 2020 | 1317 | 1714 |
| 2021 | 1141 | 1644 |
| 2022 | 1188 | 1981 |
| 2023 | 1169 | 1867 |
| 2024 | 1367 | 1751 |
| 2025 | 1423 | 1734 |
| 2026 | 983 | 1287 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- C23C 16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of22,499
- C23C 16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of14,581
- C23C 16/04Coating on selected surface areas3,429
- C23C 16/02Pretreatment of the material to be coated3,231
- C23C 16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of2,760
- C23C 16/56After-treatment2,719
- C23C 16/01On temporary substrates482
- C23C 16/006Characterized by the colour of the layer53
All 9 subgroupsShow fewer
Recent patents
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Most cited
By later US patents
- Low pressure vapor phase deposition of organic thin films1,502US 6,337,102 B12002
- Method for producing compound thin films1,267US 4,058,430 A1977
- Sequential chemical vapor deposition1,159US 5,916,365 A1999
- Method for depositing an amorphous carbon layer1,124US 6,573,030 B1APPLIED Materials.Inc. · 2003
- Method of forming metal layer using atomic layer deposition and semiconductor device having the metal layer as barrier metal layer or upper or lower electrode of capacitor1,063US 6,287,965 B1Samsung Electronics Co., Ltd. · 2001