Method of forming silicon carbide conversion coat on carbon using gas phase reactions
AssigneeGoodrich Corporation
InventorsSteven Poteet, Paul T. Perea, John S. Linck, Kirk Christopher Newton, Garth Wilks
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Abstract
A method for forming a bi-layer coating on a substrate is disclosed herein. The method includes placing the substrate in a chemical vapor deposition (CVD) furnace, the substrate including a surface, applying a reactant vapor to the surface of the substrate to form a first coating, applying methyl trichlorosilane (MTS) to the substrate after applying the reactant vapor to the substrate, and heating the CVD furnace, including the substrate, to a first temperature to form a second coating.
Claims6
A method for forming a bi-layer coating on a substrate, the method comprising:
- placing the substrate in a chemical vapor deposition (CVD) furnace, the substrate including a surface;
- applying a reactant vapor to the surface of the substrate to form a first coating;
- applying methyl trichlorosilane (MTS) to the substrate after applying the reactant vapor to the substrate;
- and
- heating the CVD furnace, including the substrate, to a first temperature to form a second coating, wherein the first temperature is about 1600° C. to about 2000° C.
Dependencies are inferred from the claim text.