C23C 16/22
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of
Official title: characterised by the deposition of inorganic material, other than metallic material
C23C16/22 (Chemical coating by decomposition of gaseous compounds, without leaving reaction products of) appears on 14,581 US grants and 17,392 published applications in this corpus.
Search patents in C23C- Granted patents
- 14,581
- Published applications
- 17,392
- Assignees
- 3,518
- Inventors
- 26,016
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 31 | 0 |
| 1977 | 23 | 0 |
| 1978 | 22 | 0 |
| 1979 | 22 | 0 |
| 1980 | 23 | 0 |
| 1981 | 25 | 0 |
| 1982 | 31 | 0 |
| 1983 | 38 | 0 |
| 1984 | 39 | 0 |
| 1985 | 39 | 0 |
| 1986 | 47 | 0 |
| 1987 | 63 | 0 |
| 1988 | 77 | 0 |
| 1989 | 96 | 0 |
| 1990 | 108 | 0 |
| 1991 | 118 | 0 |
| 1992 | 124 | 0 |
| 1993 | 172 | 0 |
| 1994 | 189 | 0 |
| 1995 | 162 | 0 |
| 1996 | 165 | 0 |
| 1997 | 219 | 0 |
| 1998 | 235 | 0 |
| 1999 | 273 | 0 |
| 2000 | 307 | 0 |
| 2001 | 327 | 143 |
| 2002 | 386 | 456 |
| 2003 | 380 | 490 |
| 2004 | 345 | 500 |
| 2005 | 312 | 543 |
| 2006 | 314 | 616 |
| 2007 | 266 | 484 |
| 2008 | 258 | 551 |
| 2009 | 278 | 654 |
| 2010 | 401 | 616 |
| 2011 | 400 | 545 |
| 2012 | 397 | 584 |
| 2013 | 427 | 575 |
| 2014 | 446 | 571 |
| 2015 | 460 | 752 |
| 2016 | 476 | 743 |
| 2017 | 532 | 763 |
| 2018 | 513 | 809 |
| 2019 | 621 | 856 |
| 2020 | 663 | 902 |
| 2021 | 595 | 895 |
| 2022 | 619 | 1029 |
| 2023 | 608 | 970 |
| 2024 | 703 | 845 |
| 2025 | 742 | 897 |
| 2026 | 464 | 603 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Filling method and film forming apparatus6 Oct 2026US 12,753,491 B2Tokyo Electron Limited
- Method of forming silicon carbide conversion coat on carbon using gas phase reactions6 Oct 2026US 12,753,492 B2Goodrich Corporation
- Method of manufacturing a redistribution layer, redistribution layer, integrated circuit and methods for electrically testing and protecting the integrated circuit6 Oct 2026US 12,753,493 B2STMicroelectronics S,r.l.
- Process for manufacturing silicon-containing materials in a cascade reactor system6 Oct 2026US 12,753,495 B2Wacker Chemie AG
- Article with transparent conductive layer and method of making the same6 Oct 2026US 12,757,521 B2Vitro Flat Glass LLC
- Cultivating methods and apparatuses8 Oct 2026US 2026/0305597 A1
- Hydrophilic antimicrobial diamond coating8 Oct 2026US 2026/0308049 A1United States Department of Energy
- Process for improving flash sintering of ceramics and improved ceramics8 Oct 2026US 2026/0308072 A1The Regents of the University of Colorado, a body corporate
- Substrate processing method and substrate processing system8 Oct 2026US 2026/0308752 A1Tokyo Electron Limited
- Fluorine-containing amorphous carbon film and method for producing same8 Oct 2026US 2026/0308753 A1Keio University
Most cited
By later US patents
- Low pressure vapor phase deposition of organic thin films1,502US 6,337,102 B12002
- Method for depositing an amorphous carbon layer1,124US 6,573,030 B1APPLIED Materials.Inc. · 2003
- Method of forming metal layer using atomic layer deposition and semiconductor device having the metal layer as barrier metal layer or upper or lower electrode of capacitor1,063US 6,287,965 B1Samsung Electronics Co., Ltd. · 2001
- Method of forming graded thin films using alternating pulses of vapor phase reactants1,034US 6,534,395 B2ASM Microchemistry Oy · 2003
- Apparatus for performing growth of compound thin films918US 4,389,973 AOy Lohja AB · 1983