C23C 16/30
Deposition of compounds, mixtures or solid solutions
Official title: Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
C23C16/30 (Deposition of compounds, mixtures or solid solutions) appears on 10,990 US grants and 13,504 published applications in this corpus.
Search patents in C23C- Granted patents
- 10,990
- Published applications
- 13,504
- Assignees
- 2,516
- Inventors
- 19,432
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 19 | 0 |
| 1977 | 11 | 0 |
| 1978 | 16 | 0 |
| 1979 | 14 | 0 |
| 1980 | 13 | 0 |
| 1981 | 22 | 0 |
| 1982 | 19 | 0 |
| 1983 | 24 | 0 |
| 1984 | 17 | 0 |
| 1985 | 26 | 0 |
| 1986 | 37 | 0 |
| 1987 | 37 | 0 |
| 1988 | 51 | 0 |
| 1989 | 56 | 0 |
| 1990 | 71 | 0 |
| 1991 | 71 | 0 |
| 1992 | 72 | 0 |
| 1993 | 94 | 0 |
| 1994 | 121 | 0 |
| 1995 | 90 | 0 |
| 1996 | 89 | 0 |
| 1997 | 122 | 0 |
| 1998 | 148 | 0 |
| 1999 | 183 | 0 |
| 2000 | 235 | 0 |
| 2001 | 246 | 114 |
| 2002 | 301 | 362 |
| 2003 | 298 | 403 |
| 2004 | 275 | 407 |
| 2005 | 267 | 457 |
| 2006 | 268 | 508 |
| 2007 | 223 | 385 |
| 2008 | 208 | 424 |
| 2009 | 233 | 481 |
| 2010 | 318 | 439 |
| 2011 | 306 | 396 |
| 2012 | 318 | 433 |
| 2013 | 316 | 417 |
| 2014 | 350 | 441 |
| 2015 | 328 | 545 |
| 2016 | 361 | 538 |
| 2017 | 392 | 539 |
| 2018 | 367 | 606 |
| 2019 | 466 | 687 |
| 2020 | 507 | 714 |
| 2021 | 479 | 718 |
| 2022 | 480 | 835 |
| 2023 | 477 | 767 |
| 2024 | 566 | 685 |
| 2025 | 601 | 716 |
| 2026 | 381 | 487 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- C23C 16/40Oxides5,977
- C23C 16/34Nitrides3,232
- C23C 16/32Carbides1,107
- C23C 16/36Carbonitrides705
- C23C 16/301Aiii bv compounds, where a is al, ga, in or tl and558
- C23C 16/308Oxynitrides512
- C23C 16/305Sulfides, selenides, or tellurides363
- C23C 16/42Silicides277
All 9 subgroupsShow fewer
Recent patents
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- Process for manufacturing a silicon carbide coated body8 Oct 2026US 2026/0308754 A1APPLIED Materials.Inc.
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Area selective deposition of metal film on silicon containing surfaces utilizing alcohols8 Oct 2026US 2026/0308761 A1Merck Patent GmbH
- Semiconductor wafer processing tool with improved leak check8 Oct 2026US 2026/0314308 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Low pressure vapor phase deposition of organic thin films1,502US 6,337,102 B12002
- Method of forming metal layer using atomic layer deposition and semiconductor device having the metal layer as barrier metal layer or upper or lower electrode of capacitor1,063US 6,287,965 B1Samsung Electronics Co., Ltd. · 2001
- Method of forming graded thin films using alternating pulses of vapor phase reactants1,034US 6,534,395 B2ASM Microchemistry Oy · 2003
- Apparatus for performing growth of compound thin films918US 4,389,973 AOy Lohja AB · 1983
- Sequencing of the recipe steps for the optimal low-k HDP-CVD processing882US 5,937,323 AAPPLIED Materials.Inc. · 1999