C23C 16/38
Borides
C23C16/38 (Borides) appears on 106 US grants and 114 published applications in this corpus.
Search patents in C23C- Granted patents
- 106
- Published applications
- 114
- Assignees
- 62
- Inventors
- 275
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 4 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 1 | 3 |
| 2005 | 0 | 4 |
| 2006 | 3 | 3 |
| 2007 | 2 | 5 |
| 2008 | 2 | 6 |
| 2009 | 3 | 1 |
| 2010 | 3 | 4 |
| 2011 | 3 | 0 |
| 2012 | 2 | 4 |
| 2013 | 2 | 3 |
| 2014 | 2 | 3 |
| 2015 | 4 | 11 |
| 2016 | 6 | 6 |
| 2017 | 5 | 8 |
| 2018 | 7 | 8 |
| 2019 | 8 | 5 |
| 2020 | 3 | 4 |
| 2021 | 4 | 6 |
| 2022 | 5 | 7 |
| 2023 | 3 | 9 |
| 2024 | 7 | 6 |
| 2025 | 6 | 4 |
| 2026 | 3 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Composition and method for making picocrystalline artificial borane atoms6 Oct 2026US 12,757,646 B2SemiNuclear, Inc.
- Titanium diboride coated refractory metal component15 Sep 2026US 12,735,786 B2Plansee SE
- Integrated method and tool for high quality selective silicon nitride deposition31 Mar 2026US 12,592,369 B2APPLIED Materials.Inc.
- Epitaxial methods including a haloborane formula for growing boron-containing structures having increased boron concentrations14 Oct 2025US 12,444,605 B2APPLIED Materials.Inc.
- Downhole sand control screen system8 Jul 2025US 12,352,136 B2Chevron U.S.A.Inc.
- Substrate processing method and substrate processing apparatus26 Mar 2026US 2026/0085407 A1Tokyo Electron Limited
- Methods of epitaxially growing boron-containing structures5 Feb 2026US 2026/0040839 A1APPLIED Materials.Inc.
- Film formation method and film formation apparatus15 Jan 2026US 2026/0015721 A1Tokyo Electron Limited
- Razor blade18 Dec 2025US 2025/0381696 A1Dorco Co., Ltd.
- Methods of forming structures including vanadium boride and vanadium phosphide layers22 May 2025US 2025/0166995 A1ASM IP Holding B. V.
Most cited
By later US patents
- Formation of boride barrier layers using chemisorption techniques529US 6,831,004 B2APPLIED Materials.Inc. · 2004
- Formation of boride barrier layers using chemisorption techniques522US 7,208,413 B2APPLIED Materials.Inc. · 2007
- Deposition of metal borides469US 10,087,522 B2ASM IP Holding B. V. · 2018
- Deposition of metal borides418US 10,190,213 B2ASM IP Holding B. V. · 2019
- CVD method for forming metal boride films using metal borane cluster compounds374US 5,277,932 ASyracuse University · 1994