C23C 16/26
Deposition of carbon only
C23C16/26 (Deposition of carbon only) appears on 2,692 US grants and 2,902 published applications in this corpus.
Search patents in C23C- Granted patents
- 2,692
- Published applications
- 2,902
- Assignees
- 1,330
- Inventors
- 6,361
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 6 | 0 |
| 1984 | 6 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 10 | 0 |
| 1988 | 11 | 0 |
| 1989 | 23 | 0 |
| 1990 | 26 | 0 |
| 1991 | 46 | 0 |
| 1992 | 43 | 0 |
| 1993 | 71 | 0 |
| 1994 | 64 | 0 |
| 1995 | 64 | 0 |
| 1996 | 70 | 0 |
| 1997 | 92 | 0 |
| 1998 | 79 | 0 |
| 1999 | 83 | 0 |
| 2000 | 58 | 0 |
| 2001 | 53 | 19 |
| 2002 | 62 | 60 |
| 2003 | 62 | 60 |
| 2004 | 44 | 67 |
| 2005 | 31 | 62 |
| 2006 | 34 | 85 |
| 2007 | 32 | 72 |
| 2008 | 32 | 88 |
| 2009 | 33 | 105 |
| 2010 | 60 | 113 |
| 2011 | 54 | 87 |
| 2012 | 48 | 89 |
| 2013 | 72 | 108 |
| 2014 | 63 | 105 |
| 2015 | 87 | 157 |
| 2016 | 83 | 155 |
| 2017 | 95 | 170 |
| 2018 | 115 | 157 |
| 2019 | 117 | 135 |
| 2020 | 124 | 145 |
| 2021 | 103 | 153 |
| 2022 | 106 | 171 |
| 2023 | 104 | 164 |
| 2024 | 121 | 142 |
| 2025 | 129 | 143 |
| 2026 | 65 | 90 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Selective deposition using graphene as an inhibitor29 Sep 2026US 12,751,261 B2Lam Research Corporation
- High selectivity, low stress, and low hydrogen carbon hardmasks in low-pressure conditions with wide gap electrode spacing15 Sep 2026US 12,735,785 B2Lam Research Corporation
- Film forming method and film forming apparatus8 Sep 2026US 12,733,415 B2Tokyo Electron Limited
- Chemical vapour deposition (CVD) reactor1 Sep 2026US 12,723,310 B2Sicona Battery Technologies Pty Ltd
- Method for applying a doped diamond layer to a substrate by chemical vapour deposition25 Aug 2026US 12,716,127 B2Carboncompetence GmbH
- Hydrophilic antimicrobial diamond coating8 Oct 2026US 2026/0308049 A1United States Department of Energy
- Method of forming protective film on outer circumferential portion including bevel portion of substrate8 Oct 2026US 2026/0311973 A1Ebara Corporation
- Silicon-carbon composite for secondary battery negative electrode material, and method for preparing same8 Oct 2026US 2026/0312014 A1Oci Company Ltd.
- In situ nucleation of diamond for thermal conductive applications8 Oct 2026US 2026/0314280 A1APPLIED Materials.Inc.
- Methods of making carbon coated particles from reclaimed carbon and other particles1 Oct 2026US 2026/0297731 A1Cabot Corporation
Most cited
By later US patents
- Method for depositing an amorphous carbon layer1,124US 6,573,030 B1APPLIED Materials.Inc. · 2003
- Semiconductor substrate process using a low temperature deposited carbon-containing hard mask566US 7,323,401 B2APPLIED Materials.Inc. · 2008
- Low temperature plasma deposition process for carbon layer deposition545US 7,312,162 B2APPLIED Materials.Inc. · 2007
- Pulsed PECVD method for modulating hydrogen content in hard mask545US 7,381,644 B1Novellus Systems, Inc. · 2008
- Method for repairing damage of dielectric film by hydrocarbon restoration and hydrocarbon depletion using UV irradiation530US 8,535,767 B1ASM IP Holding B. V. · 2013