Back to results
US 12,723,310 B2Granted
Chemical vapour deposition (CVD) reactor
AssigneeSicona Battery Technologies Pty Ltd
InventorJohn Winter
Life of this patent
Estimating the term…
Abstract
The present invention relates to a CVD reactor, particularly an entrained flow reactor, for preparing particulate materials. The invention also relates to a method of preparing such materials using a CVD reactor, particularly an entrained flow reactor. The invention further relates to electrode materials, electrodes and alkali metal-ion batteries comprising the particulate materials.
Claims12
A CVD reactor for preparing a particulate material from a feed material, the reactor comprising:
- a first inlet conduit;
- and
- a first bend having one end located at the end of the first inlet conduit, and another end located at the start of a first outlet conduit,
- further comprising n bends, wherein each bend comprises an n+1th inlet conduit and an n+1th outlet conduit, wherein an nth outlet conduit is in fluid communication with and defines an n+1th inlet conduit,
- wherein the particulate material is prepared by flowing the feed material through the inlet conduits and the outlet conduits while in contact with a hydrocarbon gas under a flowing inert gas at a temperature of between about 500° C. to about 1500° C.,
- wherein the longitudinal axes of inlet conduits and the outlet conduits are arranged in a vertical orientation, and
- wherein the first inlet conduit has a downward opening such that the feed material flows upwardly in the first inlet conduit.
4 more elements
Dependencies are inferred from the claim text.