C23C 16/24
Deposition of silicon only
C23C16/24 (Deposition of silicon only) appears on 1,272 US grants and 1,566 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,272
- Published applications
- 1,566
- Assignees
- 515
- Inventors
- 3,203
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 4 | 0 |
| 1979 | 2 | 0 |
| 1980 | 6 | 0 |
| 1981 | 2 | 0 |
| 1982 | 7 | 0 |
| 1983 | 7 | 0 |
| 1984 | 16 | 0 |
| 1985 | 12 | 0 |
| 1986 | 4 | 0 |
| 1987 | 9 | 0 |
| 1988 | 7 | 0 |
| 1989 | 13 | 0 |
| 1990 | 8 | 0 |
| 1991 | 3 | 0 |
| 1992 | 12 | 0 |
| 1993 | 12 | 0 |
| 1994 | 13 | 0 |
| 1995 | 14 | 0 |
| 1996 | 12 | 0 |
| 1997 | 17 | 0 |
| 1998 | 15 | 0 |
| 1999 | 15 | 0 |
| 2000 | 25 | 0 |
| 2001 | 33 | 11 |
| 2002 | 36 | 48 |
| 2003 | 29 | 37 |
| 2004 | 36 | 38 |
| 2005 | 20 | 38 |
| 2006 | 15 | 33 |
| 2007 | 22 | 39 |
| 2008 | 22 | 47 |
| 2009 | 18 | 79 |
| 2010 | 37 | 70 |
| 2011 | 47 | 83 |
| 2012 | 32 | 71 |
| 2013 | 40 | 66 |
| 2014 | 43 | 40 |
| 2015 | 58 | 64 |
| 2016 | 46 | 57 |
| 2017 | 48 | 66 |
| 2018 | 39 | 74 |
| 2019 | 48 | 82 |
| 2020 | 62 | 82 |
| 2021 | 49 | 62 |
| 2022 | 61 | 64 |
| 2023 | 53 | 97 |
| 2024 | 57 | 76 |
| 2025 | 49 | 89 |
| 2026 | 34 | 53 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Methods of forming structures, semiconductor processing systems, and semiconductor device structures22 Sep 2026US 12,742,242 B2ASM IP Holding B. V.
- Film forming method and film forming apparatus15 Sep 2026US 12,740,349 B2Tokyo Electron Limited
- Semiconductor device and method of forming sacrificial heteroepitaxy interface to provide substantially defect-free silicon carbide substrate1 Sep 2026US 12,727,450 B2Icemos Technology Ltd.
- Quality evaluation method, manufacturing system of silicon for evaluation, manufacturing method of silicon for evaluation, and silicon for evaluation25 Aug 2026US 12,716,884 B2Shin-Etsu Chemical Co., Ltd.
- Method for producing a solar cell11 Aug 2026US 12,707,755 B2Hanwha Q Cells GmbH
- Cultivating methods and apparatuses8 Oct 2026US 2026/0305597 A1
- Substrate processing method and substrate processing system8 Oct 2026US 2026/0308752 A1Tokyo Electron Limited
- Silicon-carbon composite for secondary battery negative electrode material, and method for preparing same8 Oct 2026US 2026/0312014 A1Oci Company Ltd.
- Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device, and recording medium24 Sep 2026US 2026/0293590 A1Kokusai Electric Corporation
- Film forming method and film forming apparatus10 Sep 2026US 2026/0265949 A1Tokyo Electron Limited
Most cited
By later US patents
- Method and system for improving dielectric film quality for void free gap fill649US 7,541,297 B2APPLIED Materials.Inc. · 2009
- Method to form ultra high quality silicon-containing compound layers618US 7,297,641 B2ASM America, Inc. · 2007
- Dopant precursors and processes596US 6,743,738 B2ASM America, Inc. · 2004
- Process for Polycrystalline film silicon growth529US 6,281,098 B1Midwest Research Institute · 2001
- Hot-filament chemical vapor deposition chamber and process with multiple gas inlets527US 6,638,839 B2The University of Toledo · 2003