Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device, and recording medium

A substrate processing method, comprising:

• mounting a substrate onto a substrate mounting table by a substrate mover;
• and
• processing the substrate in a process container, and
• wherein, in the processing the substrate, from a start of a film forming process in which a gas is supplied to the substrate in the process container and a film of a desired thickness on the substrate, before a film of a critical thickness at which the substrate cannot be separated off from the substrate mounting table by the substrate mover is formed, moves the substrate placed on the substrate mounting table by the substrate mover, and then performs a separation process that returns the substrate to its original position on the substrate mounting table.

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform a process comprising:

• mounting a substrate onto a substrate mounting table by a substrate mover;
• and
• processing the substrate in a process container, and
• wherein, in the processing the substrate, from a start of a film forming process in which a gas is supplied to the substrate in the process container and a film of a desired thickness on the substrate, before a film of a critical thickness at which the substrate cannot be separated off from the substrate mounting table by the substrate mover is formed, moves the substrate placed on the substrate mounting table by the substrate mover, and then performs a separation process that returns the substrate onto the substrate mounting table.