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US 11,417,545 B2Granted
Radiation shield
AssigneeASM IP Holding B.V.
InventorMelvin Verbaas
Life of this patent
Estimating the term…
Abstract
A radiation shield and an assembly and a reactor including the radiation shield are disclosed. The radiation shield can be used to control heat flux from a susceptor heater assembly and thereby enable better control of temperatures across a surface of a substrate placed on a surface of the susceptor heater assembly.
Claims11
An apparatus for supporting a substrate during a reaction process, the apparatus comprising:
- a susceptor heater assembly comprising a base with a side surface;
- a flow control ring defining a path for gas to flow between an upper region and a lower region of a reaction chamber in which the susceptor heater assembly is received, wherein the flow control ring is supported upon the side surface of the base and extends about a perimeter of the susceptor heater assembly;
- and
- a radiation shield attached to the flow control ring, wherein the susceptor heater assembly includes a substrate supporting portion on a top surface of the base, wherein the radiation shield is positioned opposite the substrate supporting portion proximate to a bottom surface of the base, and wherein the radiation shield comprises a planar, annular plate with an outer diameter greater than an outer diameter of the substrate supporting portion, and wherein the planar plate is supported at an outer diameter by the flow control ring and is spaced apart a distance at an inner diameter from a movable pedestal adapted to vertically position the susceptor heater assembly in the reaction chamber.
1 more element
An apparatus for supporting a substrate during a reaction process, the apparatus comprising:
- a susceptor heater assembly comprising a base with a side surface;
- a flow control ring defining a path for gas to flow between an upper region and a lower region of a reaction chamber in which the susceptor heater assembly is received, wherein the flow control ring is supported upon the side surface of the base and extends about a perimeter of the susceptor heater assembly;
- and
- a radiation shield attached to the flow control ring, wherein the susceptor heater assembly includes a substrate supporting portion on a top surface of the base, wherein the radiation shield is positioned opposite the substrate supporting portion proximate to a bottom surface of the base, and wherein the radiation shield comprises a planar, annular plate, wherein the planar, annular plate is only supported at an outer diameter by the flow control ring, wherein a gap is provided between the planar, annular plate and the bottom surface of the base of the susceptor heater assembly, and wherein the planar, annular plate does not contact the heater assembly at an inner diameter.
1 more element
Dependencies are inferred from the claim text.