Photo CVD apparatus with a glow discharge system
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Shigenori Hayashi, Takashi Inujima, Naoki Hirose
Life of this patent
Estimating the term…
Abstract
A photo CVD apparatus includes a reaction chamber, a light source for radiating light to the inside of the chamber through a light window, and a pair of electrodes disposed in the chamber for glow discharge, one of the electrodes being located on the light window. After deposition by photo CVD, a light window for transmission of UV light is cleaned by plasma etching by virtue of glow discharge taking place between the electrodes. The light source and the electrodes for plasma etching share one power supply for supplying high frequency electric power.
Claims12
A photo enhanced CVD apparatus comprising:
- a reaction chamber;
- a vacuum pump for evacuating said reaction chamber;
- a reactive gas introducing system for inputting a reactive gas into said reaction chamber;
- a holder for holding a substrate in said reaction chamber;
- a light source provided for radiating light to the inside of said reaction chamber through a light window;
- a pair of electrodes disposed in said reaction chamber wherein one of said electrodes is a conductive mesh disposed on said light window;
- and
- a power supply for supplying electric power both to said light source and to said electrodes.
A chemical vapor reaction apparatus comprising:
- a reaction chamber;
- a vacuum pump for evacuating said reaction chamber;
- a holder for holding a substrate in said reaction chamber;
- a gas supplying means for introducing a process gas into said reaction chamber;
- a light source including a gas discharge tube for emitting light to an inside of said reaction chamber through a light window;
- at last one electrode provided in said reaction chamber on a surface of said light window for performing a plasma cleaning;
- and
- a common power source for supplying power to said light source and to said at least one electrode whereby a photo enhanced chemical vapor reaction and plasma cleaning occurs in said reaction chamber.
Dependencies are inferred from the claim text.