Multi-substrate processing system

A processing system comprising:

• a processing tool comprising:
• an exhaust inlet;
• one or more outer walls and two or more inner walls, the one or more outer walls and the two or more inner walls disposed around two or more interior volumes that are each coupled to the exhaust inlet, wherein the two or more inner walls and the two or more interior volumes surround the exhaust inlet;
• and
• four or more substrate supports, each interior volume including at least one substrate support;
• and
• a transfer chamber coupled to the processing tool, the transfer chamber including a transfer robot that is configured to:
• simultaneously remove a plurality of substrates from the processing tool during a first time period, wherein the plurality of substrates are positioned in a first arrangement over the four or more substrate supports when the substrates are positioned on the transfer robot during the first time period,
• change a position of the substrates on the transfer robot;
• and
• simultaneously insert each of the substrates into the processing tool during a second time period, wherein
• the plurality of substrates are positioned in a second arrangement over the four or more substrate supports when the substrates are positioned on the transfer robot during the second time period, and
• each substrate is positioned over a different substrate support during the second time period relative to the first time period.

A processing tool comprising:

• an exhaust inlet;
• four or more process chambers surrounding the exhaust inlet, each process chamber comprising:
• a chamber body enclosing an interior volume, the chamber body comprising a plurality of sidewalls that include one or more outer walls and one or more inner walls;
• one or more substrate supports disposed in the interior volume, wherein the one or more inner walls of each process chamber form a barrier between the interior volume of the process chamber and the interior volume of another one of the four or more process chambers;
• a plurality of lamps positioned over each substrate support;
• and
• a window positioned between the plurality of lamps and the substrate support;
• a first internal port configured to open to form a passageway from the interior volume of a first process chamber of the four or more process chambers to the interior volume of a second process chamber of the four or more process chambers;
• and
• a second internal port configured to open to form a passageway from the interior volume of a third process chamber of the four or more process chambers to the interior volume of a fourth process chamber of the four or more process chambers.