C23C 16/486
Using ion beam radiation
Official title: {using ion beam radiation}
C23C16/486 (Using ion beam radiation) appears on 124 US grants and 100 published applications in this corpus.
Search patents in C23C- Granted patents
- 124
- Published applications
- 100
- Assignees
- 80
- Inventors
- 228
- Latest grant
- 7 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 4 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 4 | 0 |
| 1998 | 7 | 0 |
| 1999 | 4 | 0 |
| 2000 | 8 | 0 |
| 2001 | 5 | 1 |
| 2002 | 2 | 5 |
| 2003 | 6 | 2 |
| 2004 | 4 | 5 |
| 2005 | 5 | 2 |
| 2006 | 2 | 5 |
| 2007 | 1 | 2 |
| 2008 | 1 | 0 |
| 2009 | 4 | 1 |
| 2010 | 0 | 4 |
| 2011 | 3 | 2 |
| 2012 | 1 | 4 |
| 2013 | 1 | 8 |
| 2014 | 5 | 3 |
| 2015 | 4 | 8 |
| 2016 | 9 | 10 |
| 2017 | 8 | 4 |
| 2018 | 5 | 2 |
| 2019 | 4 | 3 |
| 2020 | 6 | 5 |
| 2021 | 5 | 5 |
| 2022 | 1 | 5 |
| 2023 | 3 | 4 |
| 2024 | 3 | 4 |
| 2025 | 3 | 4 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for long-term storage of information and storage medium therefor7 Apr 2026US 12,594,629 B2Ceramic Data Solutions GmbH
- Multi-layered diamond-like carbon coating for electronic components17 Feb 2026US 12,557,207 B2Honeywell Federal Manufacturing & Technologies, LLC
- Processes for producing orthopedic implants having a subsurface level silicon nitride layer applied via bombardment16 Sep 2025US 12,416,077 B2Joint Development, LLC
- Enhanced deposition rate by thermal isolation cover for GIS manipulator20 May 2025US 12,308,207 B2Applied Materials Israel Ltd.
- Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate18 Feb 2025US 12,230,473 B2Applied Materials Israel Ltd.
- Article comprising a nanolaminate coating13 Aug 2026US 2026/0235793 A1Corporation De L'ecole Polytechnique De Montreal
- Ion Beam-Induced Epitaxial Crystallization on an Integrated Processing Architecture5 Mar 2026US 2026/0068553 A1APPLIED Materials.Inc.
- Film forming device and method for forming carbon film11 Sep 2025US 2025/0283222 A1Resonac Hard Disk Corporation
- Processes for producing orthopedic implants having a subsurface level silicon nitride layer applied via bombardment21 Aug 2025US 2025/0263836 A1Joint Development, LLC
- Carbon containing precursors for beam-induced deposition22 May 2025US 2025/0163571 A1FEI Company
Most cited
By later US patents
- Sequential UV induced chemical vapor deposition529US 7,897,215 B1Novellus Systems, Inc. · 2011
- Sequential ion, UV, and electron induced chemical vapor deposition487US 6,627,268 B1Novellus Systems, Inc. · 2003
- Sequential electron induced chemical vapor deposition484US 6,720,260 B1Novellus Systems, Inc. · 2004
- Low dielectric constant insulating film and method for forming the same418US 8,828,886 B2Tohoku University · 2014
- Method for producing high quality thin layer films on substrates249US 5,306,530 AAssociated Universities, Inc. · 1994