Carbon containing precursors for beam-induced deposition

Abstract

Systems, components, and methods for beam-induced deposition are described. A charged particle beam system can include a vacuum chamber. The system can include a charged particle beam source, operably coupled with the vacuum chamber and including an emitter section and a column section, the charged particle beam source being configured to generate a beam of charged particles and to direct the beam of charged particles into the vacuum chamber. The system can include a precursor source, operably coupled with the vacuum chamber and configured to direct a gas stream comprising a precursor into the vacuum chamber. The precursor can include a hydrocarbon having a vapor pressure greater than about 1.6×10−4 mbar at about 293 K and about 101.3 kPa, and wherein the hydrocarbon is not naphthalene.

Dependencies are inferred from the claim text.