Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate

A system for depositing material over a sample in a localized deposition region of the sample, the system comprising:

• a vacuum chamber;
• a sample support configured to hold a sample within the vacuum chamber during a sample evaluation process;
• a charged particle beam column configured to direct a charged particle beam into the vacuum chamber toward the sample, the charged particle column including an electron gun at one end of the column and a column cap at an opposite end of the column;
• a cryo-nanomanipulator;
• and
• a processor and a memory coupled to the processor, the memory including a plurality of computer-readable instructions that, when executed by the processor, cause the system to:
• position a sample within a vacuum chamber such that the deposition region is under a field of view of the charged particle beam column;
• cool the deposition region by contacting the sample with a cryo-nanomanipulator tool in an area adjacent to the deposition region;
• inject a deposition precursor gas into the vacuum chamber at a location adjacent to the deposition region while the deposition region is cooled with the cryo-nanomanipulator tool;
• generate a charged particle beam with a charged particle beam column and focusing the charged particle beam on the sample;
• and
• scan the charged particle beam across the deposition region of the sample to activate molecules of the deposition gas that have adhered to the sample surface in the deposition region and deposit material on the sample within the deposition region.

A non-transitory computer-readable memory that stores a plurality of computer-readable instructions for evaluating a region of a sample by:

• positioning a sample within a vacuum chamber such that the deposition region is under a field of view of the charged particle beam column;
• cooling the deposition region by contacting the sample with a cryo-nanomanipulator tool in an area adjacent to the deposition region;
• injecting a deposition precursor gas into the vacuum chamber at a location adjacent to the deposition region while the deposition region is cooled with the cryo-nanomanipulator tool;
• generating a charged particle beam with a charged particle beam column and focusing the charged particle beam on the sample;
• and
• scanning the charged particle beam across the deposition region of the sample to activate molecules of the deposition gas that have adhered to the sample surface in the deposition region and deposit material on the sample within the deposition region.