Enhanced deposition rate by thermal isolation cover for GIS manipulator

A method of depositing material over a sample in a deposition region of the sample with a focused ion beam column, the method comprising:

• positioning a sample within a vacuum chamber such that the deposition region is under a field of view of the focused ion beam column;
• injecting a deposition precursor gas, with a gas injection system, into the vacuum chamber at a location adjacent to the deposition region;
• generating a focused ion beam with the focused ion beam column and focusing the ion beam within the deposition region of the sample;
• and
• scanning the focused ion beam across the deposition region of the sample to activate molecules of the deposition gas that have adhered to the sample surface in the deposition region and deposit material on the sample within the deposition region,
• wherein, while the focused ion beam is scanned across the deposition region, shielding the sample from heat radiated from the gas injection system with a thermal isolation shield comprising a high conductivity, low emissivity material.