Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween

A showerhead for use with a lamp head in a thermal processing chamber, the lamp head including a source which emits radiation that heats a substrate within the chamber, said showerhead comprising:

• a top window on a side of the showerhead that is adjacent to the lamp head;
• a bottom window on a side of the showerhead that is adjacent to the substrate during processing;
• a gas supply inlet through which a gas is introduced into a space between the top and bottom windows;
• a top plate with a plurality of holes;
• a bottom plate with a plurality of holes equal in number to the plurality of holes in the top plate;
• and
• a plurality of tubes equal in number to the plurality of holes in the top plate, each of said plurality of tubes connecting a different one of the holes in the top plate to a corresponding one of the holes in the bottom plate;
• wherein the top window is adjacent to the top plate and the bottom window is adjacent to the bottom plate, wherein the top and bottom windows are transparent to the radiation from the source in the lamp head, and wherein the bottom window includes a plurality of gas distribution holes through which gas is infected from the space between the top and bottom windows into the chamber.

A showerhead for use with a lamp head in a thermal processing chamber, the lamp head including a source which emits radiation that heats a substrate within the chamber, said showerhead comprising:

• a top window on a side of the showerhead that is adjacent to the lamp head;
• a bottom window on a side of the showerhead that is adjacent to the substrate during processing;
• a gas supply inlet through which a gas is introduced into a space between the top and bottom windows;
• a top plate with a plurality of holes;
• a bottom plate with a plurality of holes equal in number to the plurality of holes in the top plate;
• and
• a plurality of tubes equal in number to the plurality of holes in the top plate, each of said plurality of tubes connecting a different one of the holes in the top plate to a corresponding one of the holes in the bottom plate,
• wherein the top and bottom windows are transparent to the radiation from the source in the lamp head, wherein the bottom window includes a plurality of gas distribution holes through which gas is injected from the space between the top and bottom windows into the chamber, and wherein at least one of said top and bottom plates has an array of channels formed therein for distributing the gas to the gas distribution holes in the bottom window.

A thermal processing system comprising:

• a chamber defining a processing cavity;
• a lamp head;
• a showerhead positioned between the lamp head and the processing cavity in the chamber;
• and
• a substrate support mechanism within the chamber and spaced apart from the adapter plate,
• wherein said showerhead comprises:
• a top window on a side of the showerhead that is adjacent to the lamp head;
• a bottom window on a side of the showerhead that is adjacent to the substrate during processing;
• a gas supply inlet through which a gas is introduced into the space between the top and bottom windows;
• and
• a coolant structure providing a coolant flow path, wherein at least a part of the coolant structure traverses and is in thermal contact with the bottom window,
• wherein the top and bottom windows are transparent to the radiation from the source in the lamp head and wherein the bottom window includes a plurality of gas distribution holes through which gas is injected from the space between the top and bottom windows into the chamber.

A thermal processing system comprising:

• a chamber defining a processing cavity;
• a lamp head;
• a showerhead positioned between the lamp head and the processing cavity in the chamber;
• and
• a substrate support mechanism within the chamber and spaced apart from the adapter plate,
• wherein said showerhead comprises:
• a top window on a side of the showerhead that is adjacent to the lamp head;
• a bottom window on a side of the showerhead that is adjacent to the substrate during processing;
• a gas supply inlet through which a gas is introduced into the space between the top and bottom windows;
• a top plate with a plurality of holes;
• a bottom plate with a plurality of holes equal in number to the plurality of holes in the top plate;
• and
• a plurality of tubes equal in number to the plurality of holes in the top plate, each of said plurality of tubes connecting a different one of the holes in the top plate to a corresponding one of the holes in the bottom plate,
• wherein the top window is adjacent to the top plate and the bottom window is adjacent to the bottom plate, wherein the top and bottom windows are transparent to the radiation from the source in the lamp head and wherein the bottom window includes a plurality of gas distribution holes through which gas is injected from the space between the top and bottom windows into the chamber.

A thermal processing system comprising:

• a chamber defining a processing cavity;
• a lamp head;
• a showerhead positioned between the lamp head and the processing cavity in the chamber;
• and
• a substrate support mechanism within the chamber and spaced apart from the adapter plate,
• wherein said showerhead comprises:
• a top window on a side of the showerhead that is adjacent to the lamp head;
• a bottom window on a side of the showerhead that is adjacent to the substrate during processing;
• a gas supply inlet through which a gas is introduced into the space between the too and bottom windows;
• a top plate with a plurality of holes;
• a bottom plate with a plurality of holes equal in number to the plurality of holes in the top plate;
• and
• a plurality of tubes equal in number to the plurality of holes in the top plate, each of said plurality of tubes connecting a different one of the holes in the top plate to a corresponding one of the holes in the bottom plate;
• wherein the too and bottom windows are transparent to the radiation from the source in the lamp head, wherein the bottom window includes a plurality of gas distribution holes through which gas is injected from the space between the top and bottom windows into the chamber, and wherein at least one of said top and bottom plates has an array of channels formed therein for distributing the gas to the gas distribution holes in the bottom window.

An adapter plate for use with a lamp head in a thermal processing chamber, the lamp head including lamps which emit radiation that heats a substrate within the chamber, said adapter comprising:

• a top plate with a plurality of holes;
• a bottom plate with a plurality of holes equal in number to the plurality of holes in the top plate;
• a plurality of tubes equal in number to the plurality of holes in the top plate, each of said plurality of tubes connecting a different one of the holes in the top plate to a corresponding one of the holes in the bottom plate;
• a top window adjacent to the top plate;
• a bottom window adjacent to the bottom plate;
• wherein the top and bottom windows are transparent to the radiation from the lamps in the lamp head and wherein the bottom window includes a plurality of holes passing therethrough, said plurality of holes in the bottom window aligned with the plurality of tubes so that a gas supplied to said plurality of tubes flows out through said plurality of holes in the bottom window.