Upper liner ring for vapor deposition process chamber

Abstract

An upper liner ring, for a vapor deposition process chamber, includes a first ring body, a first guide, and a second guide. The first guide and the second guide are disposed opposite to each other and protrude from a lower end face of the first ring body. A first end of the first guide and a first end of the second guide are both located at an intake side of the upper liner ring. A second end of the first guide and a second end of the second guide are both located at an exhaust side of the upper liner ring. The intake side and the exhaust side of the upper liner ring are opposite sides of the upper liner ring. A distance between the first guide and the second guide gradually decreases in a direction from the intake side to the exhaust side.

Dependencies are inferred from the claim text.