C23C 16/487
Using electron radiation
Official title: {using electron radiation}
C23C16/487 (Using electron radiation) appears on 84 US grants and 79 published applications in this corpus.
Search patents in C23C- Granted patents
- 84
- Published applications
- 79
- Assignees
- 56
- Inventors
- 234
- Latest grant
- 7 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 4 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 2 |
| 2002 | 1 | 0 |
| 2003 | 1 | 0 |
| 2004 | 1 | 1 |
| 2005 | 2 | 4 |
| 2006 | 0 | 2 |
| 2007 | 1 | 3 |
| 2008 | 0 | 0 |
| 2009 | 1 | 1 |
| 2010 | 0 | 4 |
| 2011 | 1 | 3 |
| 2012 | 2 | 1 |
| 2013 | 2 | 8 |
| 2014 | 2 | 3 |
| 2015 | 2 | 7 |
| 2016 | 4 | 4 |
| 2017 | 10 | 4 |
| 2018 | 2 | 3 |
| 2019 | 4 | 1 |
| 2020 | 5 | 6 |
| 2021 | 2 | 5 |
| 2022 | 4 | 4 |
| 2023 | 2 | 2 |
| 2024 | 3 | 4 |
| 2025 | 4 | 6 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for long-term storage of information and storage medium therefor7 Apr 2026US 12,594,629 B2Ceramic Data Solutions GmbH
- Silicon compounds and methods for depositing films using same14 Oct 2025US 12,441,747 B2Versum Materials US, LLC
- Method and apparatus for forming a patterned layer of material26 Aug 2025US 12,399,428 B2ASML Netherlands B. V.
- Method and apparatus for forming a patterned layer of material10 Jun 2025US 12,325,911 B2ASML Netherlands B. V.
- Method of forming semiconductor device having carbon nanotube7 Jan 2025US 12,193,318 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Silicon Compounds And Methods For Depositing Films Using Same22 Jan 2026US 2026/0022136 A1Versum Materials US, LLC
- Method of forming a patterned layer of material, apparatus for forming a patterned layer of material4 Dec 2025US 2025/0369101 A1ASML Netherlands B. V.
- Methods of repairing extreme ultraviolet photomasks27 Nov 2025US 2025/0362590 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Carbon containing precursors for beam-induced deposition22 May 2025US 2025/0163571 A1FEI Company
- Methods of repairing extreme ultraviolet photomasks24 Apr 2025US 2025/0130490 A1
Most cited
By later US patents
- Sequential UV induced chemical vapor deposition529US 7,897,215 B1Novellus Systems, Inc. · 2011
- Sequential ion, UV, and electron induced chemical vapor deposition487US 6,627,268 B1Novellus Systems, Inc. · 2003
- Sequential electron induced chemical vapor deposition484US 6,720,260 B1Novellus Systems, Inc. · 2004
- CVD apparatus354US 5,427,824 ASemiconductor Energy Laboratory Co.Ltd. · 1995
- Method and apparatus for forming thin film and multilayer film349US 5,443,646 AMatsushita Research Institute Tokyo, Inc. · 1995