Method and apparatus for forming a patterned layer of material

A method of forming a patterned layer of material, the method comprising:

• irradiating a selected portion of a surface of a substrate during an atomic layer deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion,
• wherein the irradiation is performed using radiation having a wavelength of less than 100 nm in combination with one or more selected from:
• an electron beam, radiation having a wavelength in the range of 100 nm to 400 nm, and/or laser radiation.