CVD apparatus
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsTakashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose
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Abstract
An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
Claims14
A method of forming a film on a substrate comprising the steps of:
- placing a substrate in a reaction chamber;
- introducing a reactive gas comprising at least TEOS;
- exciting said reactive gas by supplying photo and electrical energies into said reaction chamber;
- and
- depositing a film on said substrate by CVD wherein said TEOS is in a liquid state during deposition.
A method of forming a film on a substrate comprising the steps of:
- placing a substrate in a reaction chamber;
- introducing a reactive gas comprising at least TEOS;
- supplying photo energies and plasma energies simultaneously in order to decompose said reactive gas;
- depositing a film on said substrate, wherein said TEOS is in a liquid state during deposition.
A method of forming a film on a substrate comprising the steps of:
- placing a substrate in a reaction chamber:
- introducing a reactive gas comprising at least TEOS;
- exciting said reactive gas by supplying photo and electrical energies into said reaction chamber;
- and
- depositing a film on said substrate by CVD wherein said photo and electrical energies are supplied sequentially.
A method of forming a film on a substrate comprising the steps of:
- placing a substrate in a-reaction chamber;
- introducing a reactive gas comprising at least TEOS;
- supplying a photo energy to said reactive gas to excite said gas;
- depositing a first film on said substrate;
- stopping supplying said photo energy;
- supplying a electrical energy to said reactive gas to excite said gas;
- and
- depositing a second film on said first film.
Dependencies are inferred from the claim text.