H01J 2237/3175
Lithography
H01J2237/3175 (Lithography) appears on 1,896 US grants and 1,408 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,896
- Published applications
- 1,408
- Assignees
- 323
- Inventors
- 2,132
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 5 | 0 |
| 1982 | 7 | 0 |
| 1983 | 1 | 0 |
| 1984 | 7 | 0 |
| 1985 | 10 | 0 |
| 1986 | 8 | 0 |
| 1987 | 14 | 0 |
| 1988 | 9 | 0 |
| 1989 | 12 | 0 |
| 1990 | 11 | 0 |
| 1991 | 12 | 0 |
| 1992 | 27 | 0 |
| 1993 | 27 | 0 |
| 1994 | 28 | 0 |
| 1995 | 27 | 0 |
| 1996 | 19 | 0 |
| 1997 | 28 | 0 |
| 1998 | 53 | 0 |
| 1999 | 75 | 0 |
| 2000 | 78 | 0 |
| 2001 | 95 | 30 |
| 2002 | 79 | 98 |
| 2003 | 107 | 89 |
| 2004 | 95 | 95 |
| 2005 | 67 | 78 |
| 2006 | 72 | 77 |
| 2007 | 51 | 82 |
| 2008 | 51 | 26 |
| 2009 | 59 | 21 |
| 2010 | 43 | 23 |
| 2011 | 14 | 22 |
| 2012 | 32 | 67 |
| 2013 | 39 | 65 |
| 2014 | 64 | 78 |
| 2015 | 69 | 86 |
| 2016 | 80 | 80 |
| 2017 | 81 | 61 |
| 2018 | 59 | 52 |
| 2019 | 67 | 50 |
| 2020 | 47 | 44 |
| 2021 | 34 | 30 |
| 2022 | 24 | 27 |
| 2023 | 34 | 48 |
| 2024 | 26 | 30 |
| 2025 | 26 | 21 |
| 2026 | 17 | 28 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 2237/31761Patterning strategyIndexing code580
- H01J 2237/31776Shaped beamIndexing code325
- H01J 2237/31769Proximity effect correctionIndexing code274
- H01J 2237/31774Multi-beamIndexing code253
- H01J 2237/31777By projectionIndexing code253
- H01J 2237/31793Problems associated with lithographyIndexing code253
- H01J 2237/31752Using particular beams or near-field effectsIndexing code172
- H01J 2237/31772Flood beamIndexing code2
Recent patents
- Optimizing image distortion in a multi beam charged particle processing apparatus28 Jul 2026US 12,695,055 B2IMS Nanofabrication GmbH
- Correction method of multi-beam exposure device21 Jul 2026US 12,687,789 B2Samsung Display Co., Ltd.
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus16 Jun 2026US 12,658,405 B2NuFlare Technology, Inc.
- Apparatus and methods for beam processing of substrates2 Jun 2026US 12,645,144 B2Tokyo Electron Limited
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing apparatus, data generation apparatus, complexity calculation apparatus, multi-charged particle beam writing method and data generation method6 Aug 2026US 2026/0229453 A1NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Position measurement apparatus and method and pattern forming apparatus and writing method551US 7,640,142 B2NuFlare Technology, Inc. · 2009
- Optical proximity correction method and apparatus293US 6,269,472 B1LSI Logic Corporation · 2001
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984
- High yield reticle with proximity effect halos210US 6,968,527 B2Synopsys, Inc. · 2005
- Method for generating proximity correction features for a lithographic mask pattern161US 5,663,893 AMicroUnity Systems Engineering, Inc. · 1997