H01J 2237/31774
Multi-beam
H01J2237/31774 (Multi-beam) appears on 253 US grants and 263 published applications in this corpus.
Search patents in H01J- Granted patents
- 253
- Published applications
- 263
- Assignees
- 64
- Inventors
- 374
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 6 | 0 |
| 2000 | 3 | 0 |
| 2001 | 3 | 0 |
| 2002 | 1 | 6 |
| 2003 | 4 | 4 |
| 2004 | 3 | 12 |
| 2005 | 11 | 10 |
| 2006 | 9 | 10 |
| 2007 | 8 | 8 |
| 2008 | 12 | 7 |
| 2009 | 2 | 4 |
| 2010 | 7 | 2 |
| 2011 | 2 | 5 |
| 2012 | 5 | 16 |
| 2013 | 5 | 12 |
| 2014 | 19 | 20 |
| 2015 | 19 | 17 |
| 2016 | 22 | 19 |
| 2017 | 16 | 14 |
| 2018 | 14 | 15 |
| 2019 | 21 | 13 |
| 2020 | 9 | 14 |
| 2021 | 9 | 8 |
| 2022 | 6 | 3 |
| 2023 | 8 | 14 |
| 2024 | 8 | 13 |
| 2025 | 9 | 5 |
| 2026 | 7 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Correction method of multi-beam exposure device21 Jul 2026US 12,687,789 B2Samsung Display Co., Ltd.
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Apparatus and methods for beam processing of substrates2 Jun 2026US 12,645,144 B2Tokyo Electron Limited
- Blanking aperture array system and multi charged particle beam writing apparatus5 May 2026US 12,620,545 B2NuFlare Technology, Inc.
- Beam manipulator in charged particle-beam exposure apparatus5 May 2026US 12,620,547 B2ASML Netherlands B. V.
- Multi-charged particle beam writing apparatus, data generation apparatus, complexity calculation apparatus, multi-charged particle beam writing method and data generation method6 Aug 2026US 2026/0229453 A1NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
- Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method23 Jul 2026US 2026/0213113 A1NuFlare Technology, Inc.
- Abnormality diagnosis method for blanking aperture array substrate and multi-beam writing method2 Jul 2026US 2026/0188609 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate138US 7,741,620 B2Vistec Electron Beam GmbH · 2010
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007
- Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses92US 6,617,595 B1Canon Kabushiki Kaisha · 2003
- Devices and methods for improved reflective electron beam lithography82US 8,722,286 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014