H01J 2237/31793
Problems associated with lithography
H01J2237/31793 (Problems associated with lithography) appears on 253 US grants and 232 published applications in this corpus.
Search patents in H01J- Granted patents
- 253
- Published applications
- 232
- Assignees
- 91
- Inventors
- 457
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 4 | 0 |
| 1999 | 4 | 0 |
| 2000 | 8 | 0 |
| 2001 | 14 | 4 |
| 2002 | 14 | 16 |
| 2003 | 15 | 12 |
| 2004 | 13 | 25 |
| 2005 | 13 | 10 |
| 2006 | 10 | 13 |
| 2007 | 7 | 14 |
| 2008 | 8 | 2 |
| 2009 | 11 | 3 |
| 2010 | 4 | 2 |
| 2011 | 1 | 3 |
| 2012 | 5 | 9 |
| 2013 | 4 | 9 |
| 2014 | 10 | 7 |
| 2015 | 11 | 15 |
| 2016 | 11 | 13 |
| 2017 | 10 | 9 |
| 2018 | 11 | 13 |
| 2019 | 11 | 15 |
| 2020 | 14 | 10 |
| 2021 | 8 | 4 |
| 2022 | 3 | 4 |
| 2023 | 6 | 7 |
| 2024 | 2 | 4 |
| 2025 | 4 | 2 |
| 2026 | 3 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Correction of thermal expansion in a lithographic device26 May 2026US 12,638,783 B2IMS Nanofabrication GmbH
- Method and apparatus for mask repair27 Jan 2026US 12,535,729 B2Carl Zeiss SMT GmbH
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method27 Jan 2026US 12,537,163 B2NuFlare Technology, Inc.
- Multiple charged particle beam writing apparatus, multiple charged particle beam writing method, and computer readable recording media storing program25 Nov 2025US 12,482,630 B2NuFlare Technology, Inc.
- Multi-charged particle beam writing apparatus and multi-charged particle beam writing method9 Sep 2025US 12,412,730 B2NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Evaluation pattern formation method and position variation evaluation method23 Jul 2026US 2026/0213127 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, multi-charged particle beam writing apparatus and computer readable recording medium16 Jul 2026US 2026/0204514 A1NuFlare Technology, Inc.
- Abnormality diagnosis method for blanking aperture array substrate and multi-beam writing method2 Jul 2026US 2026/0188609 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and multi-charged particle beam writing apparatus18 Jun 2026US 2026/0171355 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Position measurement apparatus and method and pattern forming apparatus and writing method551US 7,640,142 B2NuFlare Technology, Inc. · 2009
- Apparatus and methods for electron beam detection111US 8,692,204 B2KLA-Tencor Corporation · 2014
- Semiconductor device and manufacturing method thereof48US 6,964,832 B2Hitachi, Ltd. · 2005
- Focused ion beam system42US 5,945,677 AThe Regents of the University of California · 1999
- Lithographic mask and method for fabrication thereof39US 6,017,658 AThe United States of America as represented by the Secretary of the Navy · 2000