H01J 2237/31796
Affecting resists
Official title: affecting resists
H01J2237/31796 (Affecting resists) appears on 47 US grants and 44 published applications in this corpus.
Search patents in H01J- Granted patents
- 47
- Published applications
- 44
- Assignees
- 31
- Inventors
- 127
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 2 | 4 |
| 2003 | 2 | 4 |
| 2004 | 1 | 0 |
| 2005 | 4 | 1 |
| 2006 | 2 | 2 |
| 2007 | 0 | 2 |
| 2008 | 2 | 0 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 3 |
| 2012 | 2 | 4 |
| 2013 | 3 | 3 |
| 2014 | 2 | 1 |
| 2015 | 2 | 5 |
| 2016 | 4 | 3 |
| 2017 | 4 | 5 |
| 2018 | 3 | 1 |
| 2019 | 2 | 0 |
| 2020 | 1 | 2 |
| 2021 | 0 | 0 |
| 2022 | 1 | 0 |
| 2023 | 0 | 1 |
| 2024 | 0 | 2 |
| 2025 | 1 | 0 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Correction of thermal expansion in a lithographic device26 May 2026US 12,638,783 B2IMS Nanofabrication GmbH
- Multiple charged particle beam writing apparatus, multiple charged particle beam writing method, and computer readable recording media storing program25 Nov 2025US 12,482,630 B2NuFlare Technology, Inc.
- Nanofabrication using a new class of electron beam induced surface processing techniques5 Jul 2022US 11,377,740 B2FEI Company
- Nanofabrication using a new class of electron beam induced surface processing techniques21 Jan 2020US 10,538,844 B2FEI Company
- Conductive contact point pin and charged particle beam apparatus6 Aug 2019US 10,373,793 B2NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Determination of Imaging Transfer Function of a Charged-Particle Exposure Apparatus Using Isofocal Dose Measurements26 Dec 2024US 2024/0427254 A1IMS Nanofabrication GmbH
- Multiple charged particle beam writing apparatus, multiple charged particle beam writing method, and computer readable recording media storing program18 Jul 2024US 2024/0242931 A1NuFlare Technology, Inc.
- Correction of Thermal Expansion in a Lithographic Device21 Sep 2023US 2023/0296989 A1IMS Nanofabrication GmbH
- Electron beam ice lithography for fabricating 3d nanostructures13 Aug 2020US 2020/0255930 A1Zhejiang University
Most cited
By later US patents
- Electron beam lithography process36US 4,099,062 AInternational Business Machines Corporation · 1978
- Lithographic apparatus and method23US 5,209,813 AHitachi, Ltd. · 1993
- Method to define multiple layer patterns using a single exposure23US 8,791,024 B1Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Charged particle beam writing apparatus and method thereof20US 8,178,856 B2NuFlare Technology, Inc. · 2012
- Electron beam lithography method using new material18US 7,144,680 B2Samsung Electronics Co., Ltd. · 2006