Lithographic apparatus and method
AssigneeHitachi, Ltd.
InventorsYoshitada Oshida, Genya Matsuoka, Teruo Iwasaki, Toshio Kaneko, Hiroyuki Takahashi, Hiroyoshi Ando, Hidenori Yamaguchi, Katsuhiro Kawasaki
Life of this patent
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Abstract
A lithographic method and a lithographic apparatus ar disclosed in which the height of a silicon wafer making up an object of lithography is accurately measured. A lithographic apparatus such as an electron beam apparatus having a height-measuring instrument built therein is effectively used for forming a pattern on the order of submicrons.
Claims55
A lithographic apparatus comprising:
- means for generating a lithographic beam;
- means for irradiating the beam on an object of lithography;
- means for holding the object;
- means for irradiating a first light beam on the object;
- means for irradiating a second light beam on the object;
- and
- means for controlling the lithographic beam by using at least one of the first and second beams reflected on the object.
A lithographic apparatus comprising:
- means for generating a lithographic beam;
- means for irradiating the beam on an object of lithography;
- means for holding the object;
- means for irradiating a first light beam on the object;
- means for irradiating a second light beam on the object;
- means for determining the position of the object by use of at least one of the first and second light beams reflected on the object;
- and
- means for controlling the lithographic beam on the basis of the determined position of the object.
An apparatus for measuring the position of an object of lithography for a lithographic apparatus, comprising:
- means for irradiating a first light beam on the object;
- means for irradiating a second light beam on the object;
- and
- means for determining the position of the object by use of at least one of the first and second light beams reflected from the object.
A method of forming a predetermined pattern on an object of lithography by irradiating a lithographic beam on the object, comprising the steps of:
- activating means for irradiating the lithographic beam on the object on the basis of a first data corresponding to the predetermined pattern;
- irradiating a first light beam on the object;
- irradiating a second light beam on the object;
- and
- correcting the first data by use of at least one of the first and second light beams reflected on the object thereby to regulate the irradiation of the lithographic beam.
A method of forming a predetermined pattern on an object of lithography by irradiating a lithographic beam on the object, comprising the steps of:
- activating means for irradiating the lithographic beam on the object on the basis of a first data corresponding to the predetermined pattern;
- irradiating a first light beam on the object;
- irradiating a second light beam on the object;
- determining the position of the object by use of at least one of the first and second light beams reflected on the object;
- and
- correcting the first data on the basis of the determined position of the object thereby to regulate the irradiation of the lithographic beam.
A method of measuring the position of an object of lithography for a lithographic apparatus, comprising the steps of:
- irradiating a first light beam on the object;
- irradiating a second light beam on the object;
- and
- determining the position of the object by use of at least one of the first and second light beams reflected on the object.
An apparatus for subjecting an object including a resist layer to lithography, comprising:
- means for generating a lithographic beam;
- means for irradiating the lithographic beam on the object;
- means for holding the object;
- means for irradiating a P-polarized inspection light beam on the object at an angle of Brewster, thereby causing substantially the whole inspection light beam to pass through the resist layer on the object and be reflected on the surface of the object;
- and
- means for controlling the lithographic beam by use of the light beam reflected on the object.
An apparatus for subjecting an object including a resist layer to lithography, comprising:
- means for generating a lithographic beam;
- means for irradiating the lithographic beam on the object of lithography;
- means for holding the object;
- means for irradiating a P-polarized inspection light beam on the object at an angle of Brewster, thereby causing substantially the whole inspection light beam to pass through the resist layer on the object and be reflected on the surface of the object;
- means for determining the surface position of the object by use of the light beam reflected on the object;
- and
- means for controlling the lithographic beam on the basis of the determined position of the object.
An apparatus for measuring the position of an object of lithography for a lithographic apparatus, comprising:
- means for irradiating a P-polarized inspection light beam on the object at an angle of Brewster, thereby causing substantially the whole inspection light beam to pass through the resist layer on the object and be reflected on the object;
- and
- means for determining the position of the object by use of the light beam reflected on the object.
A method of forming a predetermined pattern on an object of lithography having a resist layer by irradiating a lithographic beam thereon, comprising the steps of:
- activating means for irradiating the lithographic beam on the object on the basis of a first data corresponding to the predetermined pattern;
- irradiating a P-polarized inspection light beam on the object at an angle of Brewster, thereby causing substantially the whole of the inspection light beam to pass through the resist layer on the object and be reflected on the surface of the object;
- and
- controlling the lithographic beam by use of the light beam reflected on the object.
A method of forming a predetermined pattern on an object of lithography having a resist layer by irradiating a lithographic beam thereon, comprising the steps of:
- activating means for irradiating the lithographic beam on the object on the basis of a first data corresponding to the predetermined pattern;
- irradiating a P-polarized inspection light beam on the object at an angle of Brewster, thereby causing substantially the whole of the inspection light beam to pass through the resist layer on the object and be reflected on the surface of the object;
- determining the position of the object by use of the inspection light beam reflected on the object;
- and
- controlling the lithographic beam on the basis of the determined position of the object.
A method of measuring the position of an object of lithography having a resist layer for a lithographic apparatus, comprising the steps of:
- irradiating a P-polarized inspection light beam on the object at an angle of Brewster, thereby causing substantially the whole of the inspection light beam to pass through the resist layer and be reflected on the surface of the object;
- and
- controlling the lithographic beam by use of the inspection light beam reflected on the object.
A lithographic apparatus comprising:
- means for generating a lithographic beam;
- means for irradiating the lithographic beam on an object of lithography;
- means for holding the object;
- a chamber for isolating the object from the external environment;
- means for detecting a signal from the object;
- and
- means for holding the detection means in the chamber, said holding means being supported at the ends thereof against the chamber.
An apparatus for measuring the position of an object of lithography as applied to a lithographic apparatus, comprising:
- means including light-emitting means for irradiating a light beam on the object;
- means including the light-receiving means for receiving the light beam reflected on the object and determining the position of the object by use of the result of receiving the light beam;
- and
- means for monitoring at least one of the intensity of the light beam emitted from the light-emitting means and the intensity of the light beam received by the light-receiving means.
A lithographic apparatus comprising:
- means for irradiating the lithographic beam on an object of lithography;
- means for holding the object;
- means including light-emitting mean for irradiating the light beam on the object;
- means including the light-receiving means for receiving the light beam reflected on the object and determining the position of the object by use of the result of receiving the light beam;
- and
- means for monitoring at least one of the intensity of the light beam emitted from the light-emitting means and the intensity of the light beam received by the light-receiving means.
A method of deciding on the operating condition of an apparatus for measuring the position of an object of lithography as applied to a lithographic apparatus, said measuring apparatus including means having light-emitting means for irradiating a light beam on the object, light-receiving means for receiving the light beam reflected on the object, and means for determining the position of the object by use of the result of receiving the light beam, said method comprising the steps of:
- monitoring at least one of the intensity of the light beam emitted from the light-emitting mean and the intensity of the light beam received by the light-receiving means;
- and
- deciding on the operating condition of the measuring apparatus on the basis of the result of monitoring.
A lithographic apparatus comprising:
- means for generating a lithographic beam;
- means for irradiating the lithographic beam on an object of lithography;
- means for holding the object;
- means for irradiating a plurality of light beams substantially parallel to the lithographic beam on the object;
- and
- means for controlling the lithographic beam on the basis of the light beams reflected on the object and the relationship between the positions of irradiation of the light beams and the lithographic beam.
A lithographic apparatus comprising:
- means for generating a lithographic beam;
- means for irradiating the lithographic beam on an object of lithography;
- means for holding the object;
- means for irradiating a plurality of light beams substantially parallel to the lithographic beam on the object;
- means for determining the position of the object from the light beams reflected on the object and the relationship between the positions of the light beams and the lithographic beam;
- and
- means for controlling the lithographic beam on the basis of the determined position of the object.
An apparatus for measuring the position of an object of lithography for a lithographic apparatus, comprising:
- means for irradiating a plurality of light beams substantially parallel to the lithographic beam on the object;
- means for determining the position of the object from the light beams reflected on the object and the relationship between the positions of the light beams and the lithographic beam;
- and
- means for controlling the lithographic beam on the basis of the determined position of the object.
A method of forming a predetermined pattern on an object of lithography by irradiating a lithographic beam thereon, comprising the steps of:
- activating means for irradiating the lithographic beam on the object on the basis of a first data corresponding to the predetermined pattern;
- irradiating a plurality of light beams substantially parallel to the lithographic beam on the object;
- and
- controlling the lithographic beam on the basis of the light beams and the relationship between the positions of the light beams and the lithographic beam.
A method of forming a predetermined pattern on an object of lithography by irradiating a lithographic beam thereon, comprising the steps of:
- activating means for irradiating the lithographic beam on the object on the basis of a first data corresponding to the predetermined pattern;
- irradiating a plurality of light beams substantially parallel to the lithographic beam on the object;
- determining the position of the object on the basis of the light beams reflected on the object and the relationship between the positions of the light beams and the lithographic beam;
- and
- correcting the first data on the basis of the determined position of the object thereby to regulate the irradiation of the lithographic beam.
A method of measuring the position of an object of lithography for a lithographic apparatus, comprising the steps of:
- irradiating a plurality of light beams substantially parallel to the lithographic beam on the object;
- and
- determining the position of the object on the basis of the light beams reflected on the object and the relationship between the positions of the light beams and the lithographic beam.
Dependencies are inferred from the claim text.