H01J 2237/31794
Affecting masks
Official title: affecting masks
H01J2237/31794 (Affecting masks) appears on 103 US grants and 67 published applications in this corpus.
Search patents in H01J- Granted patents
- 103
- Published applications
- 67
- Assignees
- 47
- Inventors
- 161
- Latest grant
- 27 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 7 | 0 |
| 2001 | 13 | 3 |
| 2002 | 10 | 10 |
| 2003 | 12 | 6 |
| 2004 | 10 | 18 |
| 2005 | 8 | 7 |
| 2006 | 6 | 4 |
| 2007 | 3 | 4 |
| 2008 | 2 | 0 |
| 2009 | 4 | 2 |
| 2010 | 1 | 0 |
| 2011 | 1 | 0 |
| 2012 | 1 | 0 |
| 2013 | 0 | 2 |
| 2014 | 1 | 1 |
| 2015 | 1 | 0 |
| 2016 | 1 | 1 |
| 2017 | 1 | 0 |
| 2018 | 1 | 2 |
| 2019 | 1 | 1 |
| 2020 | 1 | 2 |
| 2021 | 1 | 0 |
| 2022 | 0 | 1 |
| 2023 | 1 | 2 |
| 2024 | 1 | 1 |
| 2025 | 0 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and apparatus for mask repair27 Jan 2026US 12,535,729 B2Carl Zeiss SMT GmbH
- Method, apparatus and computer program for analyzing and/or processing of a mask for lithography1 Oct 2024US 12,105,415 B2Carl Zeiss SMT GmbH
- Charged particle beam lithography system21 Mar 2023US 11,610,758 B2Kkt Holdings Syndicate
- Methods for rapid electron area masking (REAM) lithography19 Jan 2021US 10,896,805 B2
- Electron flood lithography7 Jan 2020US 10,529,537 B1Facebook Technologies, LLC
- Compensation raster scanning28 Nov 2024US 2024/0395492 A1
- Method and apparatus for mask repair7 Sep 2023US 2023/0280647 A1Carl Zeiss SMT GmbH
- Apparatus for analyzing and/or processing a sample with a particle beam and method27 Jul 2023US 2023/0238209 A1
- Method, apparatus and computer program for analyzing and/or processing of a mask for lithography17 Feb 2022US 2022/0050389 A1Carl Zeiss SMT GmbH
- A method for creating structures or devices using an organic ice resist24 Dec 2020US 2020/0402793 A1Danmarks Tekniske Universitet
Most cited
By later US patents
- Semiconductor device and manufacturing method thereof48US 6,964,832 B2Hitachi, Ltd. · 2005
- Focused ion beam system42US 5,945,677 AThe Regents of the University of California · 1999
- Lithographic mask and method for fabrication thereof39US 6,017,658 AThe United States of America as represented by the Secretary of the Navy · 2000
- Projection-microlithography alignment method utilizing mask with separate mask substrates37US 6,171,736 B2Nikon Corporation · 2001
- Apparatus for enhancing the lifetime of stencil masks32US 6,858,118 B2IMS-Ionen Mikrofabrikations Systeme GmbH · 2005