Method, apparatus and computer program for analyzing and/or processing of a mask for lithography
AssigneeCarl Zeiss SMT GmbH
InventorOliver Jäckel
Life of this patent
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Abstract
The present invention relates to a method, an apparatus and a computer program for analyzing and/or processing of a mask for lithography, in particular a mask for EUV lithography. A method for analyzing and/or processing of a mask for lithography, in particular a mask for EUV lithography, is described, which method comprises the following steps: 1a.) generating at least one particle beam vortex; and 1b.) using the particle beam vortex for analyzing and/or processing of the mask.
Claims30
A method for analyzing and/or processing of a mask for lithography, in particular a mask for EUV lithography, comprising:
- 1a:
- generating at least one particle beam vortex;
- and
- 1b:
- using the particle beam vortex for analyzing and/or processing of the mask.
An apparatus for analyzing and/or processing of a mask for lithography, in particular a mask for EUV lithography, comprising:
- 22a. means for generating at least one particle beam vortex;
- and
- 22b. means for using the particle beam vortex for analyzing and/or processing of the mask.
Dependencies are inferred from the claim text.